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Category:G03F7/004
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Pages in category "G03F7/004"
The following 46 pages are in this category, out of 46 total.
1
- 17638730. QUANTUM DOT LIGHT-EMITTING DEVICE AND MANUFACTURING METHOD THEREOF simplified abstract (BOE TECHNOLOGY GROUP CO., LTD.)
- 17737810. PHOTORESIST COMPOSITION AND METHODS OF USE simplified abstract (TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.)
- 17742260. RESIST TOPCOAT COMPOSITION, AND METHOD OF FORMING PATTERNS USING THE COMPOSITION simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)
- 17826234. POLYMERS FOR PHOTORESIST AND PHOTORESIST COMPOSITIONS INCLUDING THE SAME simplified abstract (Samsung Electronics Co., Ltd.)
- 17841031. PHOTORESIST COMPOSITION AND METHOD OF MANUFACTURING INTEGRATED CIRCUIT DEVICE BY USING THE SAME simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)
- 17865936. IONIC SALT, RADIATION-SENSITIVE RESIST COMPOSITION COMPRISING THE SAME, AND METHOD OF FORMING PATTERN USING THE SAME simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)
- 17939153. ADDITIVE FOR PHOTORESIST, PHOTORESIST COMPOSITION FOR EUV INCLUDING THE SAME, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE USING THE SAME simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)
- 18047030. PHOTOACID GENERATOR, PHOTORESIST COMPOSITION INCLUDING THE SAME, AND METHOD OF FORMING PATTERN USING THE PHOTOACID GENERATOR simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)
- 18080348. PHOTO-DECOMPOSABLE COMPOUND, PHOTORESIST COMPOSITION INCLUDING THE SAME, AND METHOD OF MANUFACTURING INTEGRATED CIRCUIT DEVICE simplified abstract (Samsung Electronics Co., Ltd.)
- 18123095. METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE simplified abstract (Taiwan Semiconductor Manufacturing Co., Ltd.)
- 18127118. RESIST COMPOSITION AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE USING THE SAME simplified abstract (Samsung Electronics Co., Ltd.)
- 18133118. METHOD FOR FORMING RESIST PATTERN BY USING EXTREME ULTRAVIOLET LIGHT AND METHOD FOR FORMING PATTERN BY USING THE RESIST PATTERN AS MASK simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)
- 18150012. CARBOXYLATE SALT, PHOTORESIST COMPOSITION INCLUDING THE SAME, AND METHOD OF FORMING PATTERN BY USING THE PHOTORESIST COMPOSITION simplified abstract (Samsung Electronics Co., Ltd.)
- 18239301. PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN LAYER USING THE SAME, AND COLOR FILTER simplified abstract (SAMSUNG SDI CO., LTD.)
- 18314566. PHOTORESIST AND FORMATION METHOD THEREOF simplified abstract (TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.)
- 18361361. PHOTORESIST AND FORMATION METHOD THEREOF simplified abstract (TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.)
- 18503696. PHOTOACID GENERATOR simplified abstract (International Business Machines Corporation)
- 18514254. MULTI-METAL FILL WITH SELF-ALIGNED PATTERNING AND DIELECTRIC WITH VOIDS simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.)
2
S
- SAMSUNG DISPLAY CO., LTD. patent applications on February 8th, 2024
- Samsung electronics co., ltd. (20240094633). CARBOXYLATE SALT, PHOTORESIST COMPOSITION INCLUDING THE SAME, AND METHOD OF FORMING PATTERN BY USING THE PHOTORESIST COMPOSITION simplified abstract
- Samsung Electronics Co., Ltd. patent applications on February 29th, 2024
- SAMSUNG ELECTRONICS CO., LTD. patent applications on February 8th, 2024
- Samsung Electronics Co., Ltd. patent applications on March 21st, 2024
T
- Taiwan semiconductor manufacturing co., ltd. (20240096623). METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE simplified abstract
- Taiwan Semiconductor Manufacturing Co., Ltd. patent applications on March 21st, 2024
- Taiwan semiconductor manufacturing company, ltd. (20240111210). PHOTORESIST AND FORMATION METHOD THEREOF simplified abstract
- Taiwan semiconductor manufacturing company, ltd. (20240112912). PHOTORESIST AND FORMATION METHOD THEREOF simplified abstract
- TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. patent applications on April 4th, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd. patent applications on February 8th, 2024
- TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. patent applications on January 18th, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd. patent applications on March 14th, 2024
U
- US Patent Application 18230062. METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE simplified abstract
- US Patent Application 18232225. PHOTORESIST COMPOSITION AND METHOD OF FORMING PHOTORESIST PATTERN simplified abstract
- US Patent Application 18232264. PHOTORESIST COMPOSITION AND METHOD FOR MANUFACTURING A SEMICONDUCTOR DEVICE simplified abstract
- US Patent Application 18232717. PHOTORESIST UNDER-LAYER AND METHOD OF FORMING PHOTORESIST PATTERN simplified abstract
- US Patent Application 18232774. UNDERLAYER COMPOSITION AND METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE simplified abstract
- US Patent Application 18339622. LAMINATE OF NEGATIVE TONE LITHOGRAPHIC PRINTING PLATE PRECURSOR AND METHOD OF PREPARING NEGATIVE TONE LITHOGRAPHIC PRINTING PLATE simplified abstract
- US Patent Application 18365302. EUV Metallic Resist Performance Enhancement Via Additives simplified abstract
- US Patent Application 18365749. EXTREME ULTRAVIOLET MASK WITH ALLOY BASED ABSORBERS simplified abstract
- US Patent Application 18447441. PHOTORESIST WITH POLAR-ACID-LABILE-GROUP simplified abstract
- US Patent Application 18447568. PHOTORESIST MATERIALS AND ASSOCIATED METHODS simplified abstract
- US Patent Application 18448505. ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE simplified abstract