17826234. POLYMERS FOR PHOTORESIST AND PHOTORESIST COMPOSITIONS INCLUDING THE SAME simplified abstract (Samsung Electronics Co., Ltd.)

POLYMERS FOR PHOTORESIST AND PHOTORESIST COMPOSITIONS INCLUDING THE SAME

Organization Name

Samsung Electronics Co., Ltd.

Inventor(s)

Juhyeon Park of Hwaseong-si (KR)

Hyunwoo Kim of Seongnam-si (KR)

Suk Koo Hong of Suwon-si (KR)

Su Min Kim of Suwon-si (KR)

Yechan Kim of Hwaseong-si (KR)

Jicheol Park of Anyang-si (KR)

Honggu Im of Hwaseong-si (KR)

POLYMERS FOR PHOTORESIST AND PHOTORESIST COMPOSITIONS INCLUDING THE SAME - A simplified explanation of the abstract

This abstract first appeared for US patent application 17826234 titled 'POLYMERS FOR PHOTORESIST AND PHOTORESIST COMPOSITIONS INCLUDING THE SAME

Simplified Explanation

The present disclosure is about a polymer for photoresist and a photoresist composition that includes this polymer. The polymer for photoresist contains a sensitizer and a protection group. The polymerization unit of the polymer has a structure represented by chemical formula 1.

• The polymer for photoresist includes a sensitizer and a protection group.
• The polymerization unit of the polymer has a structure represented by chemical formula 1.

Potential Applications

This technology has potential applications in the field of photoresist materials used in semiconductor manufacturing and lithography processes.

Problems Solved

1. Improved sensitivity: The inclusion of a sensitizer in the polymer for photoresist enhances its sensitivity to light, allowing for more precise patterning in the lithography process. 2. Protection during processing: The protection group in the polymer provides stability and protection to the polymer during various processing steps, ensuring its integrity and functionality.

Benefits

1. Enhanced performance: The sensitizer in the polymer improves the sensitivity of the photoresist, leading to better resolution and accuracy in the lithography process. 2. Increased process stability: The protection group in the polymer protects the polymer during processing, preventing degradation and ensuring consistent performance. 3. Versatile applications: The photoresist composition can be used in various semiconductor manufacturing processes, enabling its use in a wide range of applications.

Original Abstract Submitted

The present disclosure relates to a polymer for photoresist and a photoresist composition including the same. The polymer for photoresist may include a polymerization unit comprising a sensitizer, and a protection group. The polymerization unit may include a structure of chemical formula 1: