US Patent Application 18448505. ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE simplified abstract
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE
Organization Name
Inventor(s)
Shuhei Yamaguchi of Haibara-gun (JP)
Taro Miyoshi of Haibara-gun (JP)
Tomoaki Yoshioka of Haibara-gun (JP)
Eiji Fukuzaki of Haibara-gun (JP)
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE - A simplified explanation of the abstract
This abstract first appeared for US patent application 18448505 titled 'ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE
Simplified Explanation
The patent application describes an actinic ray-sensitive or radiation-sensitive resin composition that can reduce line width roughness (LWR) in pattern formation.
- The composition contains a resin (A) with a repeating unit (a) that has an ionic group capable of generating an acid when exposed to actinic ray or radiation.
- The repeating unit (a) has a molecular weight of 300 or less when the leaving group is replaced with a hydrogen atom.
- The repeating unit (a) is present in a predetermined amount or more in relation to the total solid content of the composition.
The invention aims to improve the precision and quality of pattern formation in electronic device manufacturing.
Original Abstract Submitted
Provided are an actinic ray-sensitive or radiation-sensitive resin composition with which LWR of a pattern to be formed can be reduced; a resist film; a pattern forming method; and a method for manufacturing an electronic device. The actinic ray-sensitive or radiation-sensitive resin composition of the present invention is an actinic ray-sensitive or radiation-sensitive resin composition containing a resin (A) having a repeating unit (a), in which the repeating unit (a) is a repeating unit having an ionic group which generates an acid in a case where a leaving group is eliminated by irradiation with an actinic ray or a radiation, in which a repeating unit obtained by replacing the leaving group with a hydrogen atom has a molecular weight of 300 or less, and the repeating unit (a) is a predetermined amount or more with respect to a total solid content of the actinic ray-sensitive or radiation-sensitive resin composition.
