18047030. PHOTOACID GENERATOR, PHOTORESIST COMPOSITION INCLUDING THE SAME, AND METHOD OF FORMING PATTERN USING THE PHOTOACID GENERATOR simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)
Contents
- 1 PHOTOACID GENERATOR, PHOTORESIST COMPOSITION INCLUDING THE SAME, AND METHOD OF FORMING PATTERN USING THE PHOTOACID GENERATOR
- 1.1 Organization Name
- 1.2 Inventor(s)
- 1.3 PHOTOACID GENERATOR, PHOTORESIST COMPOSITION INCLUDING THE SAME, AND METHOD OF FORMING PATTERN USING THE PHOTOACID GENERATOR - A simplified explanation of the abstract
- 1.4 Simplified Explanation
- 1.5 Potential Applications
- 1.6 Problems Solved
- 1.7 Benefits
- 1.8 Original Abstract Submitted
PHOTOACID GENERATOR, PHOTORESIST COMPOSITION INCLUDING THE SAME, AND METHOD OF FORMING PATTERN USING THE PHOTOACID GENERATOR
Organization Name
Inventor(s)
Minsang Kim of Anseong-si (KR)
Haengdeog Koh of Hwaseong-si (KR)
Hyeran Kim of Hwaseong-si (KR)
PHOTOACID GENERATOR, PHOTORESIST COMPOSITION INCLUDING THE SAME, AND METHOD OF FORMING PATTERN USING THE PHOTOACID GENERATOR - A simplified explanation of the abstract
This abstract first appeared for US patent application 18047030 titled 'PHOTOACID GENERATOR, PHOTORESIST COMPOSITION INCLUDING THE SAME, AND METHOD OF FORMING PATTERN USING THE PHOTOACID GENERATOR
Simplified Explanation
The abstract describes a patent application for a photoacid generator, a photoresist composition, and a method of forming a pattern using the photoacid generator. The photoacid generator includes a copolymer that generates an acid upon exposure to light and an acid-labile monomer that changes solubility with a developing solvent when decomposed by an acid. The copolymer is represented by Formula 1.
- The patent application is for a photoacid generator used in photoresist compositions.
- The photoacid generator includes a copolymer that generates an acid when exposed to light.
- The copolymer also includes an acid-labile monomer that changes solubility with a developing solvent when decomposed by an acid.
- The copolymer is represented by Formula 1 in the patent application.
- The photoresist composition can be used to form patterns on a substrate.
- The method of forming a pattern involves exposing the photoresist composition to light, generating acid, and decomposing the acid-labile monomer to change solubility.
- The technology provides a way to create patterns with high precision and resolution.
Potential Applications
- Semiconductor manufacturing
- Microelectronics fabrication
- Nanotechnology research
Problems Solved
- Difficulty in creating patterns with high precision and resolution
- Limited options for photoresist compositions
Benefits
- Improved precision and resolution in pattern formation
- Increased flexibility in choosing photoresist compositions
Original Abstract Submitted
Provided are a photoacid generator, a photoresist composition including the same, and a method of forming a pattern by using the photoacid generator. The photoacid generator includes a copolymer of a monomer that generates an acid upon exposure to light and an acid-labile monomer of which solubility with respect to a developing solvent is changed by decomposition by an acid, wherein the copolymer is represented by Formula 1:
