17742260. RESIST TOPCOAT COMPOSITION, AND METHOD OF FORMING PATTERNS USING THE COMPOSITION simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)

RESIST TOPCOAT COMPOSITION, AND METHOD OF FORMING PATTERNS USING THE COMPOSITION

Organization Name

SAMSUNG ELECTRONICS CO., LTD.

Inventor(s)

Ran Namgung of Suwon-si (KR)

Hyeon Park of Suwon-si (KR)

Shinhyo Bae of Suwon-si (KR)

Daeseok Song of Suwon-si (KR)

Minki Chon of Suwon-si (KR)

Jun Soo Kim of Hwaseong-si (KR)

Hyun-Woo Kim of Seongnam-si (KR)

Hyun-Ji Song of Anyang-si (KR)

Young Joo Choi of Hwaseong-si (KR)

Suk-Koo Hong of Hwaseong-si (KR)

RESIST TOPCOAT COMPOSITION, AND METHOD OF FORMING PATTERNS USING THE COMPOSITION - A simplified explanation of the abstract

This abstract first appeared for US patent application 17742260 titled 'RESIST TOPCOAT COMPOSITION, AND METHOD OF FORMING PATTERNS USING THE COMPOSITION

Simplified Explanation

The abstract describes a resist topcoat composition and a method of forming patterns using this composition. The composition includes an acrylic copolymer, an acid compound, and a solvent.

• The resist topcoat composition is used to form patterns.
• The composition includes an acrylic copolymer with specific structural units.
• An acid compound is also included in the composition.
• The composition is dissolved in a solvent.
• The method involves applying the resist topcoat composition to a substrate and then exposing it to a patterned radiation source.
• The resist topcoat composition helps in the formation of patterns on the substrate.

Potential Applications

• Semiconductor manufacturing
• Microelectronics fabrication
• Photolithography processes

Problems Solved

• Provides a method for forming patterns on substrates.
• Enhances the efficiency and accuracy of pattern formation.
• Enables precise control over the pattern formation process.

Benefits

• Improved precision in pattern formation.
• Increased efficiency in manufacturing processes.
• Enables the production of complex patterns on substrates.

Original Abstract Submitted

A resist topcoat composition and a method of forming patterns using the resist topcoat composition. The resist topcoat composition includes an acrylic copolymer including a first structural unit represented by Chemical Formula M-1, and a second structural unit represented by Chemical Formula M-2; an acid compound; and a solvent