17865936. IONIC SALT, RADIATION-SENSITIVE RESIST COMPOSITION COMPRISING THE SAME, AND METHOD OF FORMING PATTERN USING THE SAME simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)

IONIC SALT, RADIATION-SENSITIVE RESIST COMPOSITION COMPRISING THE SAME, AND METHOD OF FORMING PATTERN USING THE SAME

Organization Name

SAMSUNG ELECTRONICS CO., LTD.

Inventor(s)

Sayaka Uchida of Tokyo (JP)

Naoki Ogiwara of Tokyo (JP)

Mitsumasa Hamano of Kanagawa (JP)

Tadao Yagi of Hwaseong-si (KR)

Nobuji Sakai of Kanagawa (JP)

IONIC SALT, RADIATION-SENSITIVE RESIST COMPOSITION COMPRISING THE SAME, AND METHOD OF FORMING PATTERN USING THE SAME - A simplified explanation of the abstract

This abstract first appeared for US patent application 17865936 titled 'IONIC SALT, RADIATION-SENSITIVE RESIST COMPOSITION COMPRISING THE SAME, AND METHOD OF FORMING PATTERN USING THE SAME

Simplified Explanation

The abstract describes an ionic salt composition that includes a polyvalent ion with a metal cluster structure or a metal oxide cluster structure and an organic ion. The composition is used in a radiation-sensitive resist composition and a pattern forming method. The polyvalent ion includes metals like tin, indium, antimony, tellurium, and bismuth, while the organic ion can be a carboxylate anion, sulfonate anion, phosphonate anion, phenoxide anion, iodonium cation, sulfonium cation, ammonium cation, or pyridinium cation.

• The patent application describes an ionic salt composition for use in a radiation-sensitive resist composition and a pattern forming method.
• The composition includes a polyvalent ion with a metal cluster structure or a metal oxide cluster structure and an organic ion.
• The polyvalent ion contains metals like tin, indium, antimony, tellurium, and bismuth.
• The organic ion can be a carboxylate anion, sulfonate anion, phosphonate anion, phenoxide anion, iodonium cation, sulfonium cation, ammonium cation, or pyridinium cation.

Potential Applications

• The technology can be used in the fabrication of microelectronics and nanoelectronics.
• It can be applied in the production of high-resolution patterns for integrated circuits.
• The composition may find use in the manufacturing of sensors, displays, and other electronic devices.

Problems Solved

• The ionic salt composition provides a radiation-sensitive resist that can be used in pattern forming methods.
• It offers improved resolution and precision in the fabrication of micro and nanoelectronic devices.
• The composition enables the production of complex patterns with high accuracy.

Benefits

• The use of the ionic salt composition allows for the creation of intricate patterns with high resolution.
• It enhances the efficiency and precision of the pattern forming process.
• The technology enables the production of advanced electronic devices with improved performance.

Original Abstract Submitted

An ionic salt includes a polyvalent ion (a) having a metal cluster structure or a metal oxide cluster structure and an organic ion (b), a radiation-sensitive resist composition including the ionic salt, and a pattern forming method, wherein the polyvalent ion (a) includes at least one metal atom selected from the group consisting of tin, indium, antimony, tellurium, and bismuth, and the organic ion (b) is at least one selected from the group consisting of: a carboxylate anion having 4 or more carbon atoms; a sulfonate anion having 4 or more carbon atoms; a phosphonate anion having 4 or more carbon atoms; a phenoxide anion having 6 or more carbon atoms; an iodonium cation having 4 or more carbon atoms; a sulfonium cation having 4 or more carbon atoms; an ammonium cation having 4 or more carbon atoms; and a pyridinium cation having 5 or more carbon atoms.