17737810. PHOTORESIST COMPOSITION AND METHODS OF USE simplified abstract (TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.)
Contents
PHOTORESIST COMPOSITION AND METHODS OF USE
Organization Name
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
Inventor(s)
Ching-Yu Chang of Hsinchu (TW)
PHOTORESIST COMPOSITION AND METHODS OF USE - A simplified explanation of the abstract
This abstract first appeared for US patent application 17737810 titled 'PHOTORESIST COMPOSITION AND METHODS OF USE
Simplified Explanation
The abstract of the patent application describes a novel composition for photoresist additives that improve their solubility in a developer solution, such as TMAH developer. These compositions also address issues related to outgassing and out-of-band effects.
- The photoresist additive compositions contain developer solubility groups that enhance their solubility in a developer solution.
- The compositions also include functional groups that help mitigate outgassing and out-of-band issues.
- The additives are designed to improve the performance and efficiency of photoresist materials used in semiconductor manufacturing processes.
Potential Applications
The technology described in this patent application has potential applications in the field of semiconductor manufacturing, specifically in the development of photoresist materials. It can be used in various processes, including lithography, etching, and patterning, to enhance the solubility of photoresist additives and improve overall performance.
Problems Solved
1. Limited solubility of photoresist additives in developer solutions can hinder their effectiveness in semiconductor manufacturing processes. 2. Outgassing and out-of-band effects can negatively impact the quality and reliability of semiconductor devices.
Benefits
1. Enhanced solubility of photoresist additives in developer solutions improves their performance and efficiency in semiconductor manufacturing processes. 2. Mitigation of outgassing and out-of-band effects leads to improved quality and reliability of semiconductor devices. 3. The novel compositions provide a more effective solution to address solubility and outgassing issues compared to existing methods.
Original Abstract Submitted
Novel photoresist additive compositions including developer solubility groups which enhance the solubility of the photoresist additive in a developer, such as a TMAH developer. The novel photoresist additive compositions also include functional groups to address outgassing and out-of-band issues.
