Pages that link to "Category:Koichi Motoyama of Clifton Park NY (US)"
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The following pages link to Category:Koichi Motoyama of Clifton Park NY (US):
View (previous 50 | next 50) (20 | 50 | 100 | 250 | 500)- US Patent Application 17804795. MAGNETO-RESISTIVE RANDOM ACCESS MEMORY WITH HEMISPHERICAL TOP ELECTRODE simplified abstract (← links)
- 17806594. SIMULTANEOUS ELECTRODES FOR MAGNETO-RESISTIVE RANDOM ACCESS MEMORY DEVICES simplified abstract (INTERNATIONAL BUSINESS MACHINES CORPORATION) (← links)
- 17806750. MAGNETO-RESISTIVE RANDOM ACCESS MEMORY WITH TAPERED SIDEWALLS simplified abstract (INTERNATIONAL BUSINESS MACHINES CORPORATION) (← links)
- 17806511. DAMASCENE MRAM DEVICE simplified abstract (INTERNATIONAL BUSINESS MACHINES CORPORATION) (← links)
- 17520672. ETCHING OF MAGNETIC TUNNEL JUNCTION (MTJ) STACK FOR MAGNETORESISTIVE RANDOM-ACCESS MEMORY (MRAM) simplified abstract (International Business Machines Corporation) (← links)
- 17453670. ELECTRONIC FUSE STRUCTURE EMBEDDED IN TOP VIA simplified abstract (International Business Machines Corporation) (← links)
- 17456016. ANTI-FUSE WITH LATERALLY EXTENDED LINER simplified abstract (International Business Machines Corporation) (← links)
- 17542882. THREE-DIMENSIONAL ROUGHNESS EXTRACTION OF METAL simplified abstract (INTERNATIONAL BUSINESS MACHINES CORPORATION) (← links)
- 17544136. SUBTRACTIVE LINE WITH DAMASCENE TOP VIA simplified abstract (INTERNATIONAL BUSINESS MACHINES CORPORATION) (← links)
- 17457747. METAL-INSULATOR-METAL CAPACITOR STRUCTURE WITH ENLARGED CAPACITOR AREA simplified abstract (INTERNATIONAL BUSINESS MACHINES CORPORATION) (← links)
- 17544150. MAGNETIC TUNNEL JUNCTION WITH AN ETCHED BOTTOM ELECTRODE HAVING NON-PLANAR SIDEWALLS simplified abstract (INTERNATIONAL BUSINESS MACHINES CORPORATION) (← links)
- 17551998. VIA ALIGNMENT IN SINGLE DAMASCENE STRUCTURE simplified abstract (INTERNATIONAL BUSINESS MACHINES CORPORATION) (← links)
- 17546682. BARRIER LINER FREE INTERFACE FOR METAL VIA simplified abstract (INTERNATIONAL BUSINESS MACHINES CORPORATION) (← links)
- 17643434. TOP VIA INTERCONNECT STRUCTURE WITH TEXTURE SUPPRESSION LAYERS simplified abstract (INTERNATIONAL BUSINESS MACHINES CORPORATION) (← links)
- 17897876. SKIP VIA WITH LOCALIZED SPACER simplified abstract (International Business Machines Corporation) (← links)
- 17943564. Large Surface VBPR for Robust Alignment in Advanced Technology Nodes simplified abstract (INTERNATIONAL BUSINESS MACHINES CORPORATION) (← links)
- 17931689. MAGNETORESISTIVE RANDOM-ACCESS MEMORY WITH TOP AND BOTTOM ELECTRODES DEPOSITED IN UNISON simplified abstract (INTERNATIONAL BUSINESS MACHINES CORPORATION) (← links)
- International business machines corporation (20240099148). MRAM TOP ELECTRODE STRUCTURE WITH LINER LAYER simplified abstract (← links)
- 17932691. MRAM TOP ELECTRODE STRUCTURE WITH LINER LAYER simplified abstract (International Business Machines Corporation) (← links)
- International business machines corporation (20240105590). STACKED FET CONTACT FORMATION simplified abstract (← links)
- International business machines corporation (20240105606). BACKSIDE POWER RAIL WITH TIGHT SPACE simplified abstract (← links)
- International business machines corporation (20240105614). TRANSISTORS WITH ENHANCED VIA-TO-BACKSIDE POWER RAIL simplified abstract (← links)
- International business machines corporation (20240105620). INTERCONNECT WITH DISCONNECTED LINER AND METAL CAP simplified abstract (← links)
- International business machines corporation (20240112986). COMPOSITE CONTACT BETWEEN BACKSIDE POWER ELEMENT AND SOURCE/DRAIN REGION simplified abstract (← links)
- International business machines corporation (20240113018). LOCALLY WIDENED PROFILE FOR NANOSCALE WIRING STRUCTURE simplified abstract (← links)
- International business machines corporation (20240120271). SKIP VIA WITH LATERAL LINE CONNECTION simplified abstract (← links)
- International business machines corporation (20240120372). SEMICONDUCTOR STRUCTURE WITH CONDUCTIVE SPACER IN SHALLOW TRENCH ISOLATION REGION simplified abstract (← links)
- 17955677. COMPOSITE CONTACT BETWEEN BACKSIDE POWER ELEMENT AND SOURCE/DRAIN REGION simplified abstract (International Business Machines Corporation) (← links)
- 17955803. LOCALLY WIDENED PROFILE FOR NANOSCALE WIRING STRUCTURE simplified abstract (International Business Machines Corporation) (← links)
- 17963281. SKIP VIA WITH LATERAL LINE CONNECTION simplified abstract (International Business Machines Corporation) (← links)
- 17963031. SEMICONDUCTOR STRUCTURE WITH CONDUCTIVE SPACER IN SHALLOW TRENCH ISOLATION REGION simplified abstract (International Business Machines Corporation) (← links)
- International business machines corporation (20240128191). POWER DISTRIBUTION NETWORK WITH BACKSIDE POWER RAIL simplified abstract (← links)
- International business machines corporation (20240130245). MRAM DEVICE STRUCTURE WITH IMPROVED TOP ELECTRODE simplified abstract (← links)
- International business machines corporation (20240135978). MRAM DEVICE WITH OCTAGON PROFILE simplified abstract (← links)
- 18048455. MRAM DEVICE WITH OCTAGON PROFILE simplified abstract (INTERNATIONAL BUSINESS MACHINES CORPORATION) (← links)