International business machines corporation (20240105614). TRANSISTORS WITH ENHANCED VIA-TO-BACKSIDE POWER RAIL simplified abstract

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TRANSISTORS WITH ENHANCED VIA-TO-BACKSIDE POWER RAIL

Organization Name

international business machines corporation

Inventor(s)

Ruilong Xie of Niskayuna NY (US)

Koichi Motoyama of Clifton Park NY (US)

Feng Liu of Niskayuna NY (US)

TRANSISTORS WITH ENHANCED VIA-TO-BACKSIDE POWER RAIL - A simplified explanation of the abstract

This abstract first appeared for US patent application 20240105614 titled 'TRANSISTORS WITH ENHANCED VIA-TO-BACKSIDE POWER RAIL

Simplified Explanation

The semiconductor structure described in the abstract includes a first via-to-backside power rail with a lower portion connected to a first backside power rail and an upper portion with a smaller width than the lower portion.

  • The semiconductor structure features a first via-to-backside power rail with two distinct portions.
  • The lower portion of the power rail is connected to a first backside power rail.
  • The upper portion of the power rail has a width that is smaller than the lower portion.

Potential Applications

This technology could be applied in:

  • Semiconductor manufacturing
  • Power distribution systems
  • Electronic devices

Problems Solved

This technology helps address issues related to:

  • Power distribution efficiency
  • Space constraints in semiconductor structures
  • Improving overall performance of electronic devices

Benefits

The benefits of this technology include:

  • Enhanced power distribution capabilities
  • Improved space utilization in semiconductor structures
  • Increased efficiency in electronic devices

Potential Commercial Applications

Potential commercial applications of this technology could include:

  • Semiconductor industry
  • Electronics manufacturing companies
  • Power management systems

Possible Prior Art

One possible prior art for this technology could be:

  • Existing semiconductor structures with similar power distribution configurations

Unanswered Questions

How does this technology compare to existing power distribution methods in semiconductor structures?

This article does not provide a direct comparison to existing power distribution methods, leaving room for further analysis and research.

What are the specific dimensions and materials used in the construction of the first via-to-backside power rail?

The article does not delve into the specific dimensions and materials used in the construction of the power rail, which could be crucial for understanding its practical implementation.


Original Abstract Submitted

a semiconductor structure includes a first via-to-backside power rail having a lower portion and an upper portion. the lower portion is connected to a first backside power rail and has a first width and the upper portion has a second width less than the first width.