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Category:C23C16/56
Subcategories
This category has the following 48 subcategories, out of 48 total.
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Pages in category "C23C16/56"
The following 103 pages are in this category, out of 103 total.
1
- 17542563. SAM FORMULATIONS AND CLEANING TO PROMOTE QUICK DEPOSITIONS simplified abstract (INTERNATIONAL BUSINESS MACHINES CORPORATION)
- 18062502. METHOD OF FORMING LOW-RESISTIVITY RU ALD THROUGH A BI-LAYER PROCESS AND RELATED STRUCTURES simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)
- 18118017. HYDROGEN PLASMA TREATMENT FOR FORMING LOGIC DEVICES simplified abstract (Applied Materials, Inc.)
- 18131956. METHOD OF FORMING A METAL LINER FOR INTERCONNECT STRUCTURES simplified abstract (Applied Materials, Inc.)
- 18161045. HIGH QUALITY INSITU TREATED PECVD FILM simplified abstract (Texas Instruments Incorporated)
- 18166196. SEMICONDUCTOR PROCESSING TOOL AND METHODS OF OPERATION simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.)
- 18172810. HIGH TEMPERATURE METAL CARBIDE COATINGS simplified abstract (HONEYWELL INTERNATIONAL INC.)
- 18181077. SEMICONDUCTOR CHAMBER COMPONENTS WITH ADVANCED COATING TECHNIQUES simplified abstract (Applied Materials, Inc.)
- 18201251. METHOD OF FORMING FILM AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE USING THE SAME simplified abstract (Samsung Electronics Co., Ltd.)
- 18228220. METHOD OF MANUFACTURING INTEGRATED CIRCUIT DEVICE simplified abstract (Samsung Electronics Co., Ltd.)
- 18347683. DIELECTRIC DENSIFICATION simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.)
- 18372792. Selective Deposition of Thin Films with Improved Stability simplified abstract (Applied Materials, Inc.)
- 18395861. METHODS AND APPARATUSES FOR CARBON DEPOSITION simplified abstract (ASM IP Holding B.V.)
- 18398796. METHODS FOR FORMING GAP-FILLING MATERIALS AND RELATED APPARATUS AND STRUCTURES simplified abstract (ASM IP Holding B.V.)
- 18398995. METHOD, SYSTEM AND APPARATUS FOR FORMING EPITAXIAL TEMPLATE LAYER simplified abstract (ASM IP Holding B.V.)
- 18434831. Display Panel, Preparation Method and Display Apparatus simplified abstract (HKC CORPORATION LIMITED)
- 18434982. CYCLICAL DEPOSITION METHODS AND STRUCTURES FORMED USING THE METHODS simplified abstract (ASM IP Holding B.V.)
- 18455941. THIN FILM STRUCTURE INCLUDING DIELECTRIC MATERIAL LAYER, METHOD OF MANUFACTURING THE SAME, AND ELECTRONIC DEVICE EMPLOYING THE SAME simplified abstract (Samsung Electronics Co., Ltd.)
- 18471854. METHOD FOR SEMICONDUCTOR PROCESSING (Tokyo Electron Limited)
- 18481976. HARD MASK LAYER AND FORMATION METHOD THEREOF (Taiwan Semiconductor Manufacturing Co., Ltd.)
- 18486291. PROCESS CHAMBER GAS FLOW IMPROVEMENT (Applied Materials, Inc.)
- 18518810. FILM FORMING METHOD AND FILM FORMING APPARATUS simplified abstract (Tokyo Electron Limited)
- 18520621. METHOD OF FORMING PATTERN STRUCTURE INCLUDING SILICON NITRIDE simplified abstract (SEMES CO., LTD.)
- 18526472. SUBSTRATE PROCESSING APPARATUS, PROCESSING METHOD, AND NON-TRANSITORY COMPUTER-READABLE RECORDING MEDIUM simplified abstract (Kokusai Electric Corporation)
- 18534880. SHOWER HEAD ASSEMBLY AND FILM FORMING APPARATUS simplified abstract (Tokyo Electron Limited)
- 18538267. INNER SPACER LINER FOR GATE-ALL-AROUND DEVICE simplified abstract (Applied Materials, Inc.)
- 18543996. TREATMENTS TO ENHANCE MATERIAL STRUCTURES simplified abstract (Applied Materials, Inc.)
- 18547888. FILM FORMING METHOD, PROCESSING APPARATUS, AND PROCESSING SYSTEM simplified abstract (Tokyo Electron Limited)
- 18595374. SEGMENTED FORMATION OF GATE INTERFACE simplified abstract (Applied Materials, Inc.)
- 18604349. INSULATING DEVICE AND METHOD FOR MANUFACTURING INSULATING DEVICE (Kabushiki Kaisha Toshiba)
- 18604349. INSULATING DEVICE AND METHOD FOR MANUFACTURING INSULATING DEVICE (TOSHIBA ELECTRONIC DEVICES & STORAGE CORPORATION)
- 18605574. TREATMENT SOLUTION AND TREATMENT METHOD simplified abstract (KABUSHIKI KAISHA TOSHIBA)
- 18605574. TREATMENT SOLUTION AND TREATMENT METHOD simplified abstract (TOHOKU UNIVERSITY)
- 18609278. INSULATING FILM FORMING METHOD AND SUBSTRATE PROCESSING SYSTEM simplified abstract (Tokyo Electron Limited)
- 18615539. AREA SELECTIVE CARBON-BASED FILM DEPOSITION simplified abstract (Applied Materials, Inc.)
- 18637396. ULTRASENSITIVE AND SELECTIVE SENSORS FOR GLUCOSE DETECTION BASED ON THIOL-FUNCTIONALIZED HETEROGENOUS GOLD/GRAPHENE/COPPER FILM simplified abstract (King Faisal University)
- 18670957. DEPOSITION APPARATUS AND METHOD OF DEPOSITING SUBSTRATE (SAMSUNG ELECTRONICS CO., LTD.)
- 18706426. FOLDABLE SUBSTRATES AND METHODS OF MAKING (Corning Incorporated)
- 18746717. APPARATUS AND METHOD FOR MANUFACTURING METAL GATE STRUCTURES simplified abstract (TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.)
- 18746869. CHEMICAL LIQUID, MANUFACTURING METHOD OF MODIFIED SUBSTRATE, MANUFACTURING METHOD OF LAMINATE, AND CHEMICAL LIQUID CONTAINER simplified abstract (FUJIFILM Corporation)
- 18886400. METHOD OF PROCESSING SUBSTRATE, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, SUBSTRATE PROCESSING APPARATUS, AND RECORDING MEDIUM (Kokusai Electric Corporation)
- 18887572. PROCESSING METHOD, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, PROCESSING APPARATUS, AND RECORDING MEDIUM (Kokusai Electric Corporation)
- 18889069. SELECTIVE DEPOSITION OF ORGANIC POLYMER MATERIAL AND DEPOSITION ASSEMBLIES (ASM IP Holding B.V.)
- 18970324. SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING SYSTEM (Tokyo Electron Limited)
- 19005512. METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE AND PATTERN FORMATION METHOD (Taiwan Semiconductor Manufacturing Company, Ltd.)
2
A
- Applied materials, inc. (20240304423). SEMICONDUCTOR CHAMBER COMPONENTS WITH ADVANCED COATING TECHNIQUES simplified abstract
- Applied materials, inc. (20240304495). HYDROGEN PLASMA TREATMENT FOR FORMING LOGIC DEVICES simplified abstract
- Applied materials, inc. (20240339318). SEGMENTED FORMATION OF GATE INTERFACE simplified abstract
- Applied materials, inc. (20240339358). METHOD OF FORMING A METAL LINER FOR INTERCONNECT STRUCTURES simplified abstract
- Applied materials, inc. (20250122621). PROCESS CHAMBER GAS FLOW IMPROVEMENT
- Applied Materials, Inc. patent applications on April 17th, 2025
- Applied Materials, Inc. patent applications on February 13th, 2025
- Applied Materials, Inc. patent applications on February 6th, 2025
- Applied Materials, Inc. patent applications on January 30th, 2025
- Applied Materials, Inc. patent applications on March 6th, 2025
- Applied Materials, Inc. patent applications on October 10th, 2024
- Applied Materials, Inc. patent applications on September 12th, 2024
B
C
F
H
I
K
- Kabushiki kaisha toshiba (20240247369). TREATMENT SOLUTION AND TREATMENT METHOD simplified abstract
- Kabushiki kaisha toshiba (20250087411). INSULATING DEVICE AND METHOD FOR MANUFACTURING INSULATING DEVICE
- KABUSHIKI KAISHA TOSHIBA patent applications on July 25th, 2024
- Kabushiki Kaisha Toshiba patent applications on March 13th, 2025
S
- Samsung electronics co., ltd. (20240213017). METHOD OF MANUFACTURING INTEGRATED CIRCUIT DEVICE simplified abstract
- Samsung electronics co., ltd. (20240429039). METHOD OF DEPOSITING FILM
- Samsung electronics co., ltd. (20250137131). DEPOSITION APPARATUS AND METHOD OF DEPOSITING SUBSTRATE
- Samsung Electronics Co., Ltd. patent applications on December 26th, 2024
- Samsung Electronics Co., Ltd. patent applications on January 18th, 2024
- Samsung Electronics Co., Ltd. patent applications on June 27th, 2024
- Samsung Electronics Co., Ltd. patent applications on May 1st, 2025
- SAMSUNG ELECTRONICS CO., LTD. patent applications on May 1st, 2025
T
- Taiwan semiconductor manufacturing co., ltd. (20250118569). HARD MASK LAYER AND FORMATION METHOD THEREOF
- Taiwan Semiconductor Manufacturing Co., Ltd. patent applications on April 10th, 2025
- Taiwan semiconductor manufacturing company, ltd. (20240102162). MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE simplified abstract
- Taiwan semiconductor manufacturing company, ltd. (20240266166). DIELECTRIC DENSIFICATION simplified abstract
- Taiwan semiconductor manufacturing company, ltd. (20240337012). APPARATUS AND METHOD FOR MANUFACTURING METAL GATE STRUCTURES simplified abstract
- Taiwan semiconductor manufacturing company, ltd. (20250147417). METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE AND PATTERN FORMATION METHOD
- Taiwan Semiconductor Manufacturing Company, Ltd. patent applications on August 8th, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd. patent applications on March 14th, 2024
- TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. patent applications on March 28th, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd. patent applications on May 8th, 2025
- TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. patent applications on October 10th, 2024
- Tokyo electron limited (20240297209). FILM FORMING METHOD, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, AND PROCESSING SYSTEM simplified abstract
- Tokyo Electron Limited patent applications on February 6th, 2025
- Tokyo Electron Limited patent applications on March 6th, 2025
- Tokyo Electron Limited patent applications on September 5th, 2024
- TOYOTA JIDOSHA KABUSHIKI KAISHA patent applications on March 6th, 2025