18889069. SELECTIVE DEPOSITION OF ORGANIC POLYMER MATERIAL AND DEPOSITION ASSEMBLIES (ASM IP Holding B.V.)
SELECTIVE DEPOSITION OF ORGANIC POLYMER MATERIAL AND DEPOSITION ASSEMBLIES
Organization Name
Inventor(s)
Bhagyesh Purohit of Helsinki FI
Charles Dezelah of Helsinki FI
Vincent Vandalon of Heverlee BE
Krzysztof Kamil Kachel of Chandler AZ US
Eric James Shero of Phoenix AZ US
Yi Cheng Zhang of Scottsdale AZ US
Anirudhan Chandrasekaran of Scottsdale AZ US
SELECTIVE DEPOSITION OF ORGANIC POLYMER MATERIAL AND DEPOSITION ASSEMBLIES
This abstract first appeared for US patent application 18889069 titled 'SELECTIVE DEPOSITION OF ORGANIC POLYMER MATERIAL AND DEPOSITION ASSEMBLIES
Original Abstract Submitted
The disclosure relates to methods and processing assemblies for selectively depositing organic polymer material on a first surface of a substrate relative to a second surface of the substrate by a cyclic deposition process is disclosed. The method comprises providing a substrate in a reaction chamber, providing a first vapor-phase organic reactant into the reaction chamber and providing a second vapor-phase organic reactant into the reaction chamber. In the method, the first and second vapor-phase organic reactants form the organic polymer material selectively on the first surface; and the first vapor-phase reactant comprises a cyclic compound comprising at least two primary amine groups.
- ASM IP Holding B.V.
- Bhagyesh Purohit of Helsinki FI
- Saima Alli of Helsinki FI
- Eva E. Tois of Espoo FI
- Marko Tuominen of Helsinki FI
- Charles Dezelah of Helsinki FI
- Vincent Vandalon of Heverlee BE
- Adam Vianna of Phoenix AZ US
- Krzysztof Kamil Kachel of Chandler AZ US
- Eric James Shero of Phoenix AZ US
- Yi Cheng Zhang of Scottsdale AZ US
- Anirudhan Chandrasekaran of Scottsdale AZ US
- C23C16/04
- C23C16/455
- C23C16/56
- H01L21/02
- CPC C23C16/04