SEMICONDUCTOR CHAMBER COMPONENTS WITH ADVANCED COATING TECHNIQUES

Organization Name

applied materials, inc.

Inventor(s)

Laksheswar Kalita of Milpitas CA (US)

Joseph Behnke of San Jose CA (US)

Ryan Pakulski of Brentwood CA (US)

Christopher L. Beaudry of San Jose CA (US)

Jonathan Strahle of San Francisco CA (US)

SEMICONDUCTOR CHAMBER COMPONENTS WITH ADVANCED COATING TECHNIQUES - A simplified explanation of the abstract

This abstract first appeared for US patent application 20240304423 titled 'SEMICONDUCTOR CHAMBER COMPONENTS WITH ADVANCED COATING TECHNIQUES

The present technology focuses on semiconductor processing systems and methods, which involve various chamber components such as a pedestal, a lid stack, a faceplate, electrode, and a showerhead.

The faceplate is supported by the lid stack and has multiple first apertures, while the showerhead, positioned between the faceplate and the pedestal, has several second apertures.
Components like the faceplate, showerhead, lid stack, pedestal, or a combination thereof are coated with yttrium fluoride, yttrium oxyfluoride, or both, with a thickness greater than 10 μm.

Potential Applications: This technology can be used in the manufacturing of semiconductor devices, specifically in processes like etching and deposition.

Problems Solved: This innovation helps improve the performance and longevity of semiconductor processing systems by providing a protective coating on critical components.

Benefits: Enhanced durability and efficiency of semiconductor processing systems, leading to improved overall productivity and cost-effectiveness.

Commercial Applications: This technology can be utilized by semiconductor manufacturing companies to enhance the quality and reliability of their products, potentially increasing market competitiveness.

Questions about Semiconductor Processing Systems: 1. How does the yttrium fluoride coating on chamber components improve semiconductor processing systems?

  The yttrium fluoride coating enhances the durability and performance of the components, leading to more efficient processing and longer system lifespan.

2. What are the specific advantages of using yttrium oxyfluoride in semiconductor processing systems?

  Yttrium oxyfluoride provides additional protection and chemical resistance to the components, further improving the overall reliability of the systems.

Original Abstract Submitted

the present technology is generally directed to semiconductor processing systems and methods. systems and methods include a chamber having a plurality of chamber components, such as a pedestal, a lid stack, a faceplate, electrode, and a showerhead. the faceplate is supported with the lid stack and defines a plurality of first apertures and the showerhead is positioned between the faceplate and the pedestal and defines a plurality of second apertures. in systems and methods, the faceplate, the showerhead, the lid stack, the pedestal, or a combination thereof include an yttrium fluoride, yttrium oxyfluoride, or both yttrium fluoroide and yttrium oxyfluoride coating having a thickness of greater than 10 �m on at least a portion of the respective chamber component or combination thereof.