Applied materials, inc. (20250122621). PROCESS CHAMBER GAS FLOW IMPROVEMENT
PROCESS CHAMBER GAS FLOW IMPROVEMENT
Organization Name
Inventor(s)
Zhepeng Cong of San Jose CA US
PROCESS CHAMBER GAS FLOW IMPROVEMENT
This abstract first appeared for US patent application 20250122621 titled 'PROCESS CHAMBER GAS FLOW IMPROVEMENT
Original Abstract Submitted
a processing system is provided that includes a process chamber. the process chamber includes: a chamber body disposed around a process volume and a substrate support. the processing system further includes a gas supply system coupled to a gas inlet of the process chamber, the gas supply system including: a main gas line connected with the gas inlet of the process chamber. the main gas line includes a first valve configured to open and provide a gas flow path through the main gas line to the process chamber. a first process gas line is connected with the main gas line at a first connection located upstream of the first valve. a second process gas line is connected with the main gas line at a second connection located upstream of the first valve. the main gas line can be separately purged upstream and downstream of the first valve.