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Category:CPC G03F7/11
Pages in category "CPC G03F7/11"
The following 83 pages are in this category, out of 83 total.
1
- 10x Genomics, Inc. Patent Application Trends in 2024
- 18271390. RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING POLYMER HAVING ALICYCLIC HYDROCARBON GROUP simplified abstract (NISSAN CHEMICAL CORPORATION)
- 18281993. NAPHTHALENE UNIT-CONTAINING RESIST UNDERLAYER FILM-FORMING COMPOSITION simplified abstract (NISSAN CHEMICAL CORPORATION)
- 18347634. METHOD OF PREVENTING PATTERN COLLAPSE (Tokyo Electron Limited)
- 18375031. SWITCHABLE UNDERLAYERS FOR EUV LITHOGRAPHY (INTEL CORPORATION)
- 18379106. EUV PHOTORESIST AND UNDERLAYER ADHESION MODULATION simplified abstract (Applied Materials, Inc.)
- 18427044. PHOTOLITHOGRAPHY METHOD AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE USING THE SAME (SAMSUNG ELECTRONICS CO., LTD.)
- 18447673. PHOTORESIST TOP COATING MATERIAL FOR ETCHING RATE CONTROL simplified abstract (Taiwan Semiconductor Manufacturing Co., Ltd.)
- 18479181. SPIN-ON ADHESION PROMOTER COMPOSITION AND METHOD FOR HIGH NUMERICAL APERTURE EXTREME ULTRAVIOLET LITHOGRAPHY (International Business Machines Corporation)
- 18578627. METHOD OF FORMING PATTERNS simplified abstract (Samsung SDI Co., Ltd.)
- 18588447. Resist Underlayer Film Material, Pattern Forming Method, And Method Of Forming Resist Underlayer Film simplified abstract (SHIN-ETSU CHEMICAL CO., LTD.)
- 18597316. Material For Forming Adhesive Film, Patterning Process, And Method For Forming Adhesive Film simplified abstract (SHIN-ETSU CHEMICAL CO., LTD.)
- 18599666. HARDMASK COMPOSITION, HARDMASK LAYER AND METHOD OF FORMING PATTERNS simplified abstract (Samsung SDI Co., Ltd.)
- 18601541. Method For Forming Resist Underlayer Film And Patterning Process simplified abstract (SHIN-ETSU CHEMICAL CO., LTD.)
- 18615313. FORMATION OF SUB-LITHOGRAPHIC MANDREL PATTERNS USING REVERSIBLE OVERCOAT (Tokyo Electron Limited)
- 18626242. RESIST UNDERLAYER COMPOSITION (TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.)
- 18663843. METHOD OF REDUCING UNDESIRED LIGHT INFLUENCE IN EXTREME ULTRAVIOLET EXPOSURE simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.)
- 18743005. THICK FILM-FORMING COMPOSITION AND METHOD FOR MANUFACTURING CURED FILM USING THE SAME simplified abstract (Merck Patent GmbH)
- 18776047. RESIST UNDERLAYER COMPOSITION AND METHOD OF FORMING PATTERNS USING THE COMPOSITION (SAMSUNG SDI CO., LTD.)
- 18817618. Compound For Forming Metal-Containing Film, Composition For Forming Metal-Containing Film, And Patterning Process (Shin-Etsu Chemical Co., Ltd.)
- 18885477. WATER SOLUBLE PROTECTIVE COATINGS FOR ENGINEERED OPTICAL DEVICES (Applied Materials, Inc.)
2
- 20250172877. Reversible Overcoat Com (Tokyo Electron Limited)
- 20250180992. Deposition Resist U (Applied Materials, .)
- 20250180993. Resist Underlayer (NISSAN CHEMICAL)
- 20250189895. Method Manufactu (TOKYO OHKA KOGYO ., .)
- 20250189896. Resist Underlayer (NISSAN CHEMICAL)
- 20250231487. Composition F (SHIN-ETSU CHEMICAL ., .)
- 20250231488. Anti-reflect (TAN KAH KEE INNOVATION LABORATORY)
- 20250231489. Resist Underlayer (NISSAN CHEMICAL)
A
- Applied materials, inc. (20250093780). WATER SOLUBLE PROTECTIVE COATINGS FOR ENGINEERED OPTICAL DEVICES
- APPLIED MATERIALS, INC. Patent Application Trends in 2025
- Applied Materials, Inc. patent applications on March 20th, 2025
- Asahi Kasei Kabushiki Kaisha Patent Application Trends in 2024
- ASML NETHERLANDS B.V. Patent Application Trends in 2025
I
- Illumina, Inc. Patent Application Trends in 2024
- IMEC VZW Patent Application Trends in 2024
- Inpria Corporation Patent Application Trends in 2024
- Intel corporation (20250110408). SWITCHABLE UNDERLAYERS FOR EUV LITHOGRAPHY
- Intel Corporation patent applications on April 3rd, 2025
- INTEL CORPORATION patent applications on April 3rd, 2025
- International business machines corporation (20250110409). SPIN-ON ADHESION PROMOTER COMPOSITION AND METHOD FOR HIGH NUMERICAL APERTURE EXTREME ULTRAVIOLET LITHOGRAPHY
- International Business Machines Corporation patent applications on April 3rd, 2025
K
M
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- Samsung electronics co., ltd. (20240411227). PHOTOLITHOGRAPHY METHOD AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE USING THE SAME
- Samsung electronics Co., Ltd. Patent Application Trends in 2024
- Samsung electronics CO., LTD. Patent Application Trends in 2025
- Samsung Electronics Co., Ltd. patent applications on December 12th, 2024
- SAMSUNG ELECTRONICS CO., LTD. patent applications on December 12th, 2024
- Samsung sdi co., ltd. (20240319601). METHOD OF FORMING PATTERNS simplified abstract
- Samsung sdi co., ltd. (20240319602). HARDMASK COMPOSITION, HARDMASK LAYER AND METHOD OF FORMING PATTERNS simplified abstract
- Samsung sdi co., ltd. (20250068076). RESIST UNDERLAYER COMPOSITION AND METHOD OF FORMING PATTERNS USING THE COMPOSITION
- SAMSUNG SDI CO., LTD. Patent Application Trends in 2025
- SAMSUNG SDI CO., LTD. patent applications on February 27th, 2025
- SAMSUNG SDI CO., LTD. patent applications on February 6th, 2025
- SAMSUNG SDI CO., LTD. patent applications on March 6th, 2025
- Samsung SDI Co., Ltd. patent applications on September 26th, 2024
- Shin-etsu chemical co., ltd. (20240337944). Resist Underlayer Film Material, Pattern Forming Method, And Method Of Forming Resist Underlayer Film simplified abstract
- Shin-Etsu Chemical Co., Ltd. Patent Application Trends in 2024
- SHIN-ETSU CHEMICAL CO., LTD. patent applications on October 10th, 2024
T
- Taiwan Semiconductor Manufacturing Co., Ltd Patent Application Trends in 2024
- Taiwan semiconductor manufacturing co., ltd. (20240192601). PHOTORESIST TOP COATING MATERIAL FOR ETCHING RATE CONTROL simplified abstract
- Taiwan Semiconductor Manufacturing Co., Ltd. Patent Application Trends in 2024
- Taiwan Semiconductor Manufacturing Co., Ltd. patent applications on June 13th, 2024
- Taiwan Semiconductor Manufacturing Company Patent Application Trends in 2025
- Taiwan semiconductor manufacturing company, ltd. (20240295820). METHOD OF REDUCING UNDESIRED LIGHT INFLUENCE IN EXTREME ULTRAVIOLET EXPOSURE simplified abstract
- Taiwan semiconductor manufacturing company, ltd. (20250130499). RESIST UNDERLAYER COMPOSITION
- Taiwan Semiconductor Manufacturing Company, Ltd. Patent Application Trends in 2024
- Taiwan Semiconductor Manufacturing Company, Ltd. Patent Application Trends in 2025
- TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. Patent Application Trends in 2025
- TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. patent applications on April 24th, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd. patent applications on September 5th, 2024
- TOKYO ELECTRON LIMITED Patent Application Trends in 2024
- Tokyo Electron Limited Patent Application Trends in 2024
- TOKYO ELECTRON LIMITED Patent Application Trends in 2025
- Tokyo Electron Limited Patent Application Trends in 2025