ASML NETHERLANDS B.V. Patent Application Trends in 2025
ASML NETHERLANDS B.V. Patent Filing Activity
ASML NETHERLANDS B.V. patent applications in 2025
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Top 10 Technology Areas
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- G06T2207/30148 (Subject of image; Context of image processing)
- Count: 11 patents
- Example: 20250036030. AUTO PARAMETER TUNING FOR CHARGED PARTICLE INSPECTION IMAGE ALIGNMENT (ASML Netherlands B.V.)
- G03F7/70633 (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices)
- H01J37/28 (with scanning beams {()
- G06T2207/10061 (Image acquisition modality)
- G03F7/706837 (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices)
- G06T2207/20081 (Special algorithmic details)
- G03F7/70033 (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices)
- Count: 7 patents
- Example: 20250008634. OPTICAL SYSTEM AND METHOD FOR A RADIATION SOURCE (ASML Netherlands B.V.)
- G03F7/70525 (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices)
- Count: 7 patents
- Example: 20250044707. LITHOGRAPHIC PERFORMANCE QUALIFICATION AND ASSOCIATED APPARATUSES (ASML NETHERLANDS B.V.)
- G03F7/706841 (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices)
- Count: 6 patents
- Example: 20250044709. METHOD AND APPARATUS TO DETERMINE OVERLAY (ASML NETHERLANDS B.V.)
- G03F7/70655 (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices)
Emerging Technology Areas
- G06N3/0455 (Auto-encoder networks; Encoder-decoder networks)
- G06N20/00 (Machine learning)
- Count: 1 patents
- Example: 20250103964. TRAINING A MODEL TO GENERATE PREDICTIVE DATA (ASML Netherlands B.V.)
- G06N3/092 (Reinforcement learning)
- G06N3/0499 (Feedforward networks)
- G06N3/0464 (Convolutional networks [CNN, ConvNet])
- G06N3/044 (Recurrent networks, e.g. Hopfield networks)
- G06N3/045 (Combinations of networks)
- G03F7/70575 (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices)
- Count: 1 patents
- Example: 20250102902. ASSEMBLY FOR A LITHOGRAPHIC APPARATUS (ASML NETHERLANDS B.V.)
- H01J2237/204 (Means for introducing and/or outputting objects (locks)
- Count: 1 patents
- Example: 20250014857. METHOD AND SYSTEM OF REDUCING CHAMBER VIBRATION (ASML Netherlands B.V.)
- H01J2237/0216 (ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS (spark-gaps)
- Count: 1 patents
- Example: 20250014857. METHOD AND SYSTEM OF REDUCING CHAMBER VIBRATION (ASML Netherlands B.V.)
Top Inventors
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- Lingling PU of San Jose CA (US) (6 patents)
- Marco Jan-Jaco WIELAND (4 patents)
- Bastiaan Lambertus Wilhelmus Marinus VAN DE VEN (3 patents)
- Ferry ZIJP (3 patents)
- Krishanu SHOME of Cheshire CT (US) (2 patents)
- Simon Reinald HUISMAN (2 patents)
- Sebastianus Adrianus GOORDEN (2 patents)
- Kaustuve BHATTACHARYYA (2 patents)
- Xuedong LIU of San Jose CA (US) (2 patents)
- Weiming REN of San Jose CA (US) (2 patents)
Patent Categories
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Geographical Distribution of Inventors
Geographical Distribution of US Inventors
Categories:
- ASML NETHERLANDS B.V.
- Companies
- CPC G03F7/7065
- CPC G03F1/84
- CPC G03F7/70655
- CPC G06T7/0004
- CPC G06T7/30
- CPC H01L22/12
- CPC G06T2207/10061
- CPC G06T2207/30148
- CPC G03F7/706849
- CPC G01B11/27
- CPC G03F7/70625
- CPC G03F7/70633
- CPC G03F7/706837
- CPC G03F7/706851
- CPC G03F9/7026
- CPC G03F7/70641
- CPC H01J37/153
- CPC H01J37/1471
- CPC H01J37/1475
- CPC H01J37/20
- CPC H01J2237/0209
- CPC H01J2237/1536
- CPC H01J2237/20221
- CPC H01J2237/24578
- CPC H01J37/28
- CPC G01N23/2251
- CPC H01J37/265
- CPC H01J2237/20207
- CPC H01J2237/20292
- CPC H01J2237/2482
- CPC H01J37/145
- CPC H01J37/1474
- CPC H01J37/244
- CPC H01J2237/24475
- CPC H01J2237/2448
- CPC G01Q10/04
- CPC G01Q60/32
- CPC G01Q70/14
- CPC G03F7/70341
- CPC G03F7/70716
- CPC G03F9/7065
- CPC G03F7/70566
- CPC H01L21/6833
- CPC F16K3/182
- CPC F16K51/02
- CPC G06T7/001
- CPC G01N2223/401
- CPC G06T2207/20081
- CPC G06T2207/20084
- CPC G03F1/62
- CPC G03F1/24
- CPC G03F7/705
- CPC G03F7/70508
- CPC H01L22/20
- CPC G03F9/7046
- CPC G03F7/70775
- CPC G03F9/7088
- CPC G06T3/14
- CPC G06T5/60
- CPC H01J37/222
- CPC H01J2237/221
- CPC H01J2237/2817
- CPC G06T5/50
- CPC G06T5/77
- CPC G06T5/80
- CPC G01N2223/07
- CPC G01N2223/418
- CPC G01N2223/507
- CPC H01J2237/2806
- CPC H01J2237/2809
- CPC H05G2/0086
- CPC G02B19/0019
- CPC G02B19/0047
- CPC G03F7/70033
- CPC G03F7/702
- CPC G03F7/70233
- CPC G01N21/8806
- CPC G01N21/9501
- CPC G01N21/956
- CPC G02B7/1805
- CPC G02B7/1822
- CPC G03F7/70525
- CPC G03F7/70433
- CPC G03F7/70858
- CPC G03F9/7011
- CPC G03F7/706841
- CPC G03F7/706847
- CPC G06T2207/20056
- CPC G03F7/706835
- CPC G03F9/7092
- CPC G06T7/337
- CPC G03F9/7034
- CPC H01J37/3177
- CPC H01J2237/0453
- CPC H01J2237/1534
- CPC H01J37/32422
- CPC H01J37/32339
- CPC H01J37/32366
- CPC H01L21/3065
- CPC H01L21/32136
- CPC H01L21/67069
- CPC H01J2237/3341
- CPC G03F7/2004
- CPC H01J61/16
- CPC H01J61/302
- CPC H01J61/33
- CPC G03F7/70275
- CPC G03F7/70366
- CPC G03F7/70475
- CPC G03F1/36
- CPC G03F1/70
- CPC G03F7/70441
- CPC G03F7/70516
- CPC G03F7/70741
- CPC G03F7/70783
- CPC G03F7/70875
- CPC G03F1/82
- CPC G03F7/70141
- CPC G03F7/7025
- CPC G03F7/70258
- CPC G03F7/70358
- CPC G03F7/70666
- CPC G03F7/70725
- CPC G03F7/706845
- CPC G03F7/70708
- CPC G03F7/70916
- CPC G03F7/70808
- CPC B25J18/02
- CPC G03F7/70925
- CPC G03F7/70891
- CPC H05G2/0023
- CPC H05G2/008
- CPC G01N2223/6116
- CPC G01N2223/646
- CPC G06T2207/20216
- CPC G06T2207/20224
- CPC G06T2207/30144
- CPC G06T2207/30168
- CPC G06V10/774
- CPC G06F18/214
- CPC G06T7/0006
- CPC G06V10/776
- CPC G06V10/993
- CPC G03F1/44
- CPC G03F7/70683
- CPC G03F7/706833
- CPC G03F7/7085
- CPC G03F9/7069
- CPC G05B23/024
- CPC G05B23/0272
- CPC G03F7/0045
- CPC G03F7/095
- CPC G03F7/11
- CPC G03F7/26
- CPC G06T5/70
- CPC H01J2237/24495
- CPC H01J37/09
- CPC H01J2237/026
- CPC G01R31/307
- CPC G03F7/70491
- CPC G03F7/706839
- CPC G03F9/7084
- CPC G03F9/7042
- CPC G03F7/70733
- CPC G03F7/70
- CPC G05B19/40931
- CPC G05B2219/45028
- CPC G05B2219/45031
- CPC G06N20/20
- CPC H05G2/0092
- CPC G01B11/272
- CPC G02B5/005
- CPC H05G2/0082
- CPC G03F7/70558
- CPC G01B11/24
- CPC G03F7/70041
- CPC G03F7/70175
- CPC G03F7/70983
- CPC H01J37/321
- CPC H01J37/32862
- CPC H05H1/46
- CPC H05H1/463
- CPC H01J2237/24592
- CPC H01J37/226
- CPC G03F7/70825
- CPC G06F30/20
- CPC G01R31/2881
- CPC G01N21/8851
- CPC G01N2021/8883
- CPC H01J37/12
- CPC H01J2237/0262
- CPC H01J2237/0451
- CPC H01J2237/047
- CPC H01J2237/1202
- CPC H01J2237/1207
- CPC H01J37/185
- CPC H01J2237/0216
- CPC H01J2237/204
- CPC G03F7/70575
- CPC G06N3/045
- CPC G06N3/044
- CPC G06N3/0464
- CPC G06N3/0499
- CPC G06N3/092
- CPC G06N20/00
- CPC G06N3/0455
- Patent Trends by Company in 2025