Inpria Corporation Patent Application Trends in 2024
Inpria Corporation Patent Filing Activity
Inpria Corporation patent applications in 2024
Top 10 Technology Areas
- C07F7/2224 (ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM (metal-containing porphyrins)
- G03F7/0392 (Macromolecular compounds which are photodegradable, e.g. positive electron resists ()
- G03F1/22 (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices)
- G03F1/48 (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices)
- G03F7/0017 ({Phase modulating patterns, e.g. refractive index patterns})
- G03F7/0042 ({with inorganic or organometallic light-sensitive compounds not otherwise provided for, e.g. inorganic resists ()
- G03F7/0382 (Macromolecular compounds which are rendered insoluble or differentially wettable ()
- G03F7/11 (having cover layers or intermediate layers, e.g. subbing layers {()
- G03F7/2004 (Exposure; Apparatus therefor (photographic printing apparatus for making copies)
- G03F7/2037 (Exposure; Apparatus therefor (photographic printing apparatus for making copies)
Emerging Technology Areas
- G03F7/38 (Treatment before imagewise removal, e.g. prebaking {()
- G03F7/0045 ({with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors})
- G03F7/0044 (Photosensitive materials ()
- G03F7/20 (Exposure; Apparatus therefor (photographic printing apparatus for making copies)
- G03F7/168 ({Finishing the coated layer, e.g. drying, baking, soaking})
- B05D1/005 ({Spin coating})
- G03F7/0043 ({Chalcogenides; Silicon, germanium, arsenic or derivatives thereof; Metals, oxides or alloys thereof ()
- B01J2231/44 (CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS)
- Count: 1 patents
- Example: 20240199658. DIRECT SYNTHESIS OF ORGANOTIN ALKOXIDES simplified abstract (Inpria Corporation)
- C07F7/2296 (ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM (metal-containing porphyrins)
- Count: 1 patents
- Example: 20240199658. DIRECT SYNTHESIS OF ORGANOTIN ALKOXIDES simplified abstract (Inpria Corporation)
- B01J35/39 (Photocatalytic properties)
- Count: 1 patents
- Example: 20240199658. DIRECT SYNTHESIS OF ORGANOTIN ALKOXIDES simplified abstract (Inpria Corporation)
Top Inventors
- Jeremy T. Anderson of Corvallis OR (US) (2 patents)
- Kai Jiang of Corvallis OR (US) (2 patents)
- Stephen T. Meyers of Corvallis OR (US) (2 patents)
- Brian J. Cardineau of Corvallis OR (US) (2 patents)
- Peter De Schepper (1 patent)
- Jason K. Stowers of Corvallis OR (US) (1 patent)
- Sangyoon Woo (1 patent)
- Michael Kocsis of Albany OR (US) (1 patent)
- Alan J. Telecky of Albany OR (US) (1 patent)
- Joseph B. Edson of Corvallis OR (US) (1 patent)
Patent Categories
Geographical Distribution of Inventors
Geographical Distribution of US Inventors
Categories:
- Inpria Corporation
- Companies
- CPC G03F7/0392
- CPC G03F1/22
- CPC G03F1/48
- CPC G03F7/0017
- CPC G03F7/0042
- CPC G03F7/0382
- CPC G03F7/11
- CPC G03F7/2004
- CPC G03F7/2037
- CPC G03F7/42
- CPC C07F7/2284
- CPC C07F7/2224
- CPC B01J31/0279
- CPC B01J35/39
- CPC C07F7/2296
- CPC B01J2231/44
- CPC G03F7/0043
- CPC B05D1/005
- CPC G03F7/168
- CPC G03F7/20
- CPC G03F7/0044
- CPC G03F7/0045
- CPC G03F7/38
- Patent Trends by Company in 2024