Intel corporation (20250110408). SWITCHABLE UNDERLAYERS FOR EUV LITHOGRAPHY
SWITCHABLE UNDERLAYERS FOR EUV LITHOGRAPHY
Organization Name
Inventor(s)
Robert Jordan of Portland OR US
Brandon Holybee of Portland OR US
James Blackwell of Portland OR US
Blake Bluestein of Hillsboro OR US
Eric Mattson of Portland OR US
Marie Krysak of Portland OR US
Nicole Guzman of Newberg OR US
Shane Harlson of Beaverton OR US
Florian Gstrein of Portland OR US
SWITCHABLE UNDERLAYERS FOR EUV LITHOGRAPHY
This abstract first appeared for US patent application 20250110408 titled 'SWITCHABLE UNDERLAYERS FOR EUV LITHOGRAPHY
Original Abstract Submitted
provided are methods and compounds for using an adhesively switchable underlayer beneath a photoresist in a lithographic process for making a semiconductor wafer.
Categories:
- Intel corporation
- Robert Jordan of Portland OR US
- Brandon Holybee of Portland OR US
- James Blackwell of Portland OR US
- Blake Bluestein of Hillsboro OR US
- Eric Mattson of Portland OR US
- Marie Krysak of Portland OR US
- Nicole Guzman of Newberg OR US
- Shane Harlson of Beaverton OR US
- Eungnak Han of Portland OR US
- Florian Gstrein of Portland OR US
- G03F7/11
- G03F7/20
- G03F7/38
- CPC G03F7/11