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Category:CPC H01L21/02274
Pages in category "CPC H01L21/02274"
The following 52 pages are in this category, out of 52 total.
1
- 18161045. HIGH QUALITY INSITU TREATED PECVD FILM simplified abstract (Texas Instruments Incorporated)
- 18376057. SEAM-FREE SINGLE OPERATION AMORPHOUS SILICON GAP FILL (Applied Materials, Inc.)
- 18395907. PARTIAL BREAKDOWN OF PRECURSORS FOR ENHANCED ALD FILM GROWTH simplified abstract (ASM IP Holding B.V.)
- 18485172. METHODS TO IMPROVE OXIDE SIDEWALL QUALITY (Applied Materials, Inc.)
- 18584540. DIRECTIONAL SELECTIVE FILL USING HIGH DENSITY PLASMA simplified abstract (Applied Materials, Inc.)
- 18609278. INSULATING FILM FORMING METHOD AND SUBSTRATE PROCESSING SYSTEM simplified abstract (Tokyo Electron Limited)
- 18838595. SUBTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS (Tokyo Electron Limited)
A
- Applied materials, inc. (20240258103). PLASMA TREATMENT OF BARRIER AND LINER LAYERS simplified abstract
- Applied materials, inc. (20250112039). SEAM-FREE SINGLE OPERATION AMORPHOUS SILICON GAP FILL
- Applied materials, inc. (20250125145). METHODS TO IMPROVE OXIDE SIDEWALL QUALITY
- APPLIED MATERIALS, INC. Patent Application Trends in 2025
- Applied Materials, Inc. patent applications on April 17th, 2025
- Applied Materials, Inc. patent applications on April 3rd, 2025
- Applied Materials, Inc. patent applications on August 1st, 2024
- Applied Materials, Inc. patent applications on February 13th, 2025
- Applied Materials, Inc. patent applications on February 20th, 2025
- Applied Materials, Inc. patent applications on February 6th, 2025
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- SAMSUNG ELECTRONICS CO., LTD Patent Application Trends in 2024
- Samsung Electronics Co., Ltd. Patent Application Trends in 2024
- SAMSUNG ELECTRONICS CO., LTD. Patent Application Trends in 2024
- Samsung electronics Co., Ltd. Patent Application Trends in 2024
- Samsung electronics CO., LTD. Patent Application Trends in 2025
- SEMES CO., LTD. Patent Application Trends in 2024
- Semiconductor Energy Laboratory Co., Ltd. Patent Application Trends in 2025
T
- Taiwan Semiconductor Manufacturing Co., Ltd Patent Application Trends in 2024
- Taiwan Semiconductor Manufacturing Co., Ltd. Patent Application Trends in 2024
- TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. Patent Application Trends in 2025
- TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD. Patent Application Trends in 2025
- Taiwan Semiconductor Manufacturing Company Patent Application Trends in 2025
- Taiwan Semiconductor Manufacturing Company, Ltd. Patent Application Trends in 2024
- Taiwan Semiconductor Manufacturing Company, Ltd. Patent Application Trends in 2025
- TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. Patent Application Trends in 2025
- Tokyo electron limited (20250149329). SUBTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
- TOKYO ELECTRON LIMITED Patent Application Trends in 2024
- Tokyo Electron Limited Patent Application Trends in 2024
- TOKYO ELECTRON LIMITED Patent Application Trends in 2025
- Tokyo Electron Limited Patent Application Trends in 2025
- Tokyo Electron Limited patent applications on February 6th, 2025
- Tokyo Electron Limited patent applications on May 8th, 2025