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Category:CPC C23C16/45561
Pages in category "CPC C23C16/45561"
The following 46 pages are in this category, out of 46 total.
1
- 18118499. PRECURSOR DELIVERY SYSTEM FOR SEMICONDUCTOR DEVICE FORMATION simplified abstract (Applied Materials, Inc.)
- 18395822. METHODS AND APPARATUS FOR AN ACCUMULATOR simplified abstract (ASM IP Holding B.V.)
- 18419021. GAS SUPPLY SYSTEM simplified abstract (Samsung Electronics Co., Ltd.)
- 18479214. APPARATUS FOR TREATING SUBSTRATE AND METHOD FOR TREATING SUBSTRATE USING THE SAME simplified abstract (Samsung Display Co., LTD.)
- 18484057. FAST SWITCHING GAS CIRCUITS AND PROCESSING CHAMBERS, AND RELATED METHODS AND APPARATUS, FOR GAS STABILIZATION (Applied Materials, Inc.)
- 18486291. PROCESS CHAMBER GAS FLOW IMPROVEMENT (Applied Materials, Inc.)
- 18830706. METHODS AND SYSTEM FOR MITIGATING CVD FORELINE GROWTH (ASM IP Holding B.V.)
- 18884897. SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE AND NON-TRANSITORY COMPUTER-READABLE RECORDING MEDIUM (Kokusai Electric Corporation)
- 18889183. SEMICONDUCTOR MANUFACTURING APPARATUS AND PROCESS (ASM IP Holding B.V.)
- 18890180. Substrate Processing Apparatus, Substrate Processing Method, Method of Manufacturing Semiconductor Device and Non-transitory Computer-readable Recording Medium (Kokusai Electric Corporation)
2
- 20250163577. Semiconductor Apparatus Gas Distributor Semiconductor Appa (BEIJING NAURA MICROELECTRONICS EQUIPMENT ., .)
- 20250171900. Process Gas Recycling (ASM IP Holding B.V.)
- 20250179636. Gas Intake Devic (SwaySure Technology ., .)
- 20250215566. Process Chamber Gas Su (Applied Materials, .)
- 20250215567. Substrate Process (Kokusai Electric)
- 20250215568. Substrate Process (Kokusai Electric)
A
- Applied materials, inc. (20240247374). PRECURSOR DELIVERY SYSTEM FOR SEMICONDUCTOR DEVICE FORMATION simplified abstract
- Applied materials, inc. (20250066915). FAST SWITCHING GAS CIRCUITS AND PROCESSING CHAMBERS, AND RELATED METHODS AND APPARATUS, FOR GAS STABILIZATION
- Applied materials, inc. (20250122621). PROCESS CHAMBER GAS FLOW IMPROVEMENT
- APPLIED MATERIALS, INC. Patent Application Trends in 2025
- Applied Materials, Inc. patent applications on April 17th, 2025
- Applied Materials, Inc. patent applications on February 27th, 2025
- Applied Materials, Inc. patent applications on January 23rd, 2025
- Applied Materials, Inc. patent applications on January 30th, 2025
- Applied Materials, Inc. patent applications on July 25th, 2024
L
S
- Samsung Display Co., LTD Patent Application Trends in 2024
- Samsung display co., ltd. (20240218513). APPARATUS FOR TREATING SUBSTRATE AND METHOD FOR TREATING SUBSTRATE USING THE SAME simplified abstract
- SAMSUNG DISPLAY CO., LTD. Patent Application Trends in 2024
- Samsung Display Co., Ltd. Patent Application Trends in 2024
- Samsung Display Co., LTD. patent applications on July 4th, 2024
- SAMSUNG ELECTRONICS CO., LTD Patent Application Trends in 2024
- Samsung electronics co., ltd. (20240279808). GAS SUPPLY SYSTEM simplified abstract
- Samsung Electronics Co., Ltd. Patent Application Trends in 2024
- SAMSUNG ELECTRONICS CO., LTD. Patent Application Trends in 2024
- Samsung electronics Co., Ltd. Patent Application Trends in 2024
- Samsung electronics CO., LTD. Patent Application Trends in 2025
- Samsung Electronics Co., Ltd. patent applications on August 22nd, 2024
T
- TOKYO ELECTRON LIMITED Patent Application Trends in 2024
- Tokyo Electron Limited Patent Application Trends in 2024
- TOKYO ELECTRON LIMITED Patent Application Trends in 2025
- Tokyo Electron Limited Patent Application Trends in 2025
- Tokyo Electron Limited patent applications on March 6th, 2025
- TOTO LTD. Patent Application Trends in 2025