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Category:C23C16/04
Subcategories
This category has the following 48 subcategories, out of 48 total.
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B
C
E
H
I
J
K
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Y
Pages in category "C23C16/04"
The following 110 pages are in this category, out of 110 total.
1
- 17542563. SAM FORMULATIONS AND CLEANING TO PROMOTE QUICK DEPOSITIONS simplified abstract (INTERNATIONAL BUSINESS MACHINES CORPORATION)
- 17957610. STACKING TOOL FIXTURE FOR FORCED FLOW CHEMICAL VAPOR INFILTRATION simplified abstract (Raytheon Technologies Corporation)
- 17991931. AREA SELECTIVE DEPOSITION THROUGH SURFACE SILYLATION simplified abstract (Applied Materials, Inc.)
- 18109365. ELECTRONIC DEVICE FABRICATION USING AREA-SELECTIVE DEPOSITION simplified abstract (Applied Materials, Inc.)
- 18118450. CHEMICAL VAPOR INFILTRATION TOOLING HOLE MODIFICATION FOR OPTIMIZING INFILTRATION IN CERAMIC MATRIX COMPOSITES simplified abstract (Raytheon Technologies Corporation)
- 18149829. SELECTIVE METAL SELECTIVITY IMPROVEMENT WITH RF PULSING simplified abstract (Applied Materials, Inc.)
- 18201251. METHOD OF FORMING FILM AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE USING THE SAME simplified abstract (Samsung Electronics Co., Ltd.)
- 18329662. MASK ASSEMBLY, APPARATUS OF MANUFACTURING THE SAME, METHOD OF REPAIRING THE MASK ASSEMBLY, AND METHOD OF MANUFACTURING THE MASK ASSEMBLY simplified abstract (SAMSUNG DISPLAY CO., LTD.)
- 18371708. Methods for Depositing Film Layers (Applied Materials, Inc.)
- 18372792. Selective Deposition of Thin Films with Improved Stability simplified abstract (Applied Materials, Inc.)
- 18382977. PROCESS FOR MANUFACTURING A SILICON CARBIDE COATED BODY simplified abstract (Applied Materials, Inc.)
- 18394133. METHODS FOR INCREASING THE DENSITY OF HIGH-INDEX NANOIMPRINT LITHOGRAPHY FILMS simplified abstract (Applied Materials, Inc.)
- 18395788. ETCHING METHOD AND PLASMA PROCESSING APPARATUS simplified abstract (Tokyo Electron Limited)
- 18396829. METHOD OF FORMING MOLYBDENUM SILICIDE simplified abstract (ASM IP Holding B.V.)
- 18396835. METHODS AND ASSEMBLIES FOR SELECTIVELY DEPOSITING MOLYBDENUM simplified abstract (ASM IP Holding B.V.)
- 18397722. METHODS FOR SELECTIVELY FORMING AND UTILIZING A PASSIVATION LAYER ON A SUBSTRATE AND RELATED STRUCTURES INCLUDING A PASSIVATION LAYER simplified abstract (ASM IP Holding B.V.)
- 18398146. ETCHING METHOD AND PLASMA PROCESSING APPARATUS simplified abstract (Tokyo Electron Limited)
- 18418757. SUBSTRATE TREATMENT METHOD, SUBSTRATE TREATMENT APPARATUS, AND COMPUTER STORAGE MEDIUM simplified abstract (Tokyo Electron Limited)
- 18449822. MASK ASSEMBLY AND MANUFACTURING METHOD THEREOF simplified abstract (Samsung Display Co., LTD.)
- 18450563. MASK ASSEMBLY AND MASK ASSEMBLY MANUFACTURING METHOD simplified abstract (Samsung Display Co., LTD.)
- 18495330. DEPOSITION OF CARBON GAPFILL MATERIALS (Applied Materials, Inc.)
- 18512894. LOW RESISTIVITY GAPFILL simplified abstract (Applied Materials, Inc.)
- 18512923. METHOD AND SYSTEM FOR PROCESSING SUBSTRATES simplified abstract (Samsung Electronics Co., Ltd.)
- 18515842. Semiconductor Device, Method and Machine of Manufacture simplified abstract (Taiwan Semiconductor Manufacturing Co., Ltd.)
- 18520621. METHOD OF FORMING PATTERN STRUCTURE INCLUDING SILICON NITRIDE simplified abstract (SEMES CO., LTD.)
- 18538267. INNER SPACER LINER FOR GATE-ALL-AROUND DEVICE simplified abstract (Applied Materials, Inc.)
- 18547888. FILM FORMING METHOD, PROCESSING APPARATUS, AND PROCESSING SYSTEM simplified abstract (Tokyo Electron Limited)
- 18557675. PROCESSING SYSTEM AND METHODS FOR FORMING VOID-FREE AND SEAM-FREE TUNGSTEN FEATURES simplified abstract (Applied Materials, Inc.)
- 18615430. DISPLAY ARTICLES WITH ANTIGLARE SURFACES AND THIN, DURABLE ANTIREFLECTION COATINGS simplified abstract (Corning Incorporated)
- 18615539. AREA SELECTIVE CARBON-BASED FILM DEPOSITION simplified abstract (Applied Materials, Inc.)
- 18616741. VOID FREE LOW STRESS FILL simplified abstract (Lam Research Corporation)
- 18626719. SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING SYSTEM simplified abstract (Tokyo Electron Limited)
- 18639575. METHOD FOR MANUFACTURING A SEMICONDUCTOR DEVICE simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.)
- 18646003. MASK ASSEMBLY AND MANUFACTURING METHOD THEREOF simplified abstract (Samsung Display Co., LTD.)
- 18649004. METAL COMPONENTS WITH INERT VAPOR PHASE COATING ON INTERNAL SURFACES simplified abstract (AGILENT TECHNOLOGIES, INC.)
- 18649035. METAL COMPONENTS WITH INERT VAPOR PHASE COATING ON INTERNAL SURFACES simplified abstract (AGILENT TECHNOLOGIES, INC.)
- 18649171. METAL COMPONENTS WITH INERT VAPOR PHASE COATING ON INTERNAL SURFACES simplified abstract (AGILENT TECHNOLOGIES, INC.)
- 18649199. METAL COMPONENTS WITH INERT VAPOR PHASE COATING ON INTERNAL SURFACES simplified abstract (AGILENT TECHNOLOGIES, INC.)
- 18649231. METAL COMPONENTS WITH INERT VAPOR PHASE COATING ON INTERNAL SURFACES simplified abstract (AGILENT TECHNOLOGIES, INC.)
- 18649268. METAL COMPONENTS WITH INERT VAPOR PHASE COATING ON INTERNAL SURFACES simplified abstract (AGILENT TECHNOLOGIES, INC.)
- 18649302. METAL COMPONENTS WITH INERT VAPOR PHASE COATING ON INTERNAL SURFACES simplified abstract (AGILENT TECHNOLOGIES, INC.)
- 18726285. DETERMINATION METHOD AND SUBSTRATE PROCESSING APPARATUS (Tokyo Electron Limited)
- 18746869. CHEMICAL LIQUID, MANUFACTURING METHOD OF MODIFIED SUBSTRATE, MANUFACTURING METHOD OF LAMINATE, AND CHEMICAL LIQUID CONTAINER simplified abstract (FUJIFILM Corporation)
- 18828100. SPONGE-LIKE POROUS BODY, POLISHING PAD, LIQUID ABSORBING PAD, CLEANING SPONGE, CULTIVATION SPONGE AND METHOD FOR PRODUCING SPONGE-LIKE POROUS BODY (CANON KABUSHIKI KAISHA)
- 18887572. PROCESSING METHOD, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, PROCESSING APPARATUS, AND RECORDING MEDIUM (Kokusai Electric Corporation)
- 18889069. SELECTIVE DEPOSITION OF ORGANIC POLYMER MATERIAL AND DEPOSITION ASSEMBLIES (ASM IP Holding B.V.)
- 18889140. SELECTIVE DEPOSITION OF INHIBITOR MATERIAL AND A DEPOSITION ASSEMBLIES (ASM IP Holding B.V.)
- 18895226. SELECTIVE PROCESSING WITH ETCH RESIDUE-BASED INHIBITORS (Lam Research Corporation)
- 18896073. DEVICE AND METHOD FOR MANUFACTURING DISPLAY APPARATUS (Samsung Display Co., LTD.)
- 18914403. Method and system for filling a gap (ASM IP Holding B.V.)
- 18926748. POLYMERIC INHIBITOR FOR AREA SELECTIVE DEPOSITION (ASM IP Holding B.V.)
- 18956601. SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF (Taiwan Semiconductor Manufacturing Co., Ltd.)
2
- 20240011150. METHOD AND APPARATUS FOR FORMING A PATTERNED LAYER OF CARBON, METHOD OF FORMING A PATTERNED LAYER OF MATERIAL simplified abstract (ASML Netherlands B.V.)
- 20240040808. TECHNIQUES AND DEVICE STRUCTURE BASED UPON DIRECTIONAL SEEDING AND SELECTIVE DEPOSITION simplified abstract (Applied Materials, Inc.)
3
A
- Applied materials, inc. (20240264336). NON-LINE-OF-SIGHT DEPOSITION OF COATING ON INTERNAL COMPONENTS OF ASSEMBLED DEVICE simplified abstract
- Applied materials, inc. (20240282632). ELECTRONIC DEVICE FABRICATION USING AREA-SELECTIVE DEPOSITION simplified abstract
- Applied materials, inc. (20250101575). Methods for Depositing Film Layers
- Applied Materials, Inc. patent applications on August 22nd, 2024
- Applied Materials, Inc. patent applications on August 8th, 2024
- Applied Materials, Inc. patent applications on February 13th, 2025
- Applied Materials, Inc. patent applications on February 6th, 2025
- Applied Materials, Inc. patent applications on March 27th, 2025
- Applied Materials, Inc. patent applications on March 6th, 2025
B
C
F
R
S
- Samsung display co., ltd. (20240124965). MASK ASSEMBLY AND MASK ASSEMBLY MANUFACTURING METHOD simplified abstract
- Samsung display co., ltd. (20240133019). MASK ASSEMBLY AND MANUFACTURING METHOD THEREOF simplified abstract
- Samsung display co., ltd. (20240200181). THIN FILM DEPOSITION APPARATUS simplified abstract
- Samsung display co., ltd. (20240200186). DEPOSITION APPARATUS simplified abstract
- Samsung display co., ltd. (20240229220). MASK ASSEMBLY AND MANUFACTURING METHOD THEREOF simplified abstract
- Samsung display co., ltd. (20240279788). MASK ASSEMBLY AND MANUFACTURING METHOD THEREOF simplified abstract
- Samsung display co., ltd. (20250011921). DEVICE AND METHOD FOR MANUFACTURING DISPLAY APPARATUS
- Samsung Display Co., LTD. patent applications on April 18th, 2024
- Samsung Display Co., LTD. patent applications on April 25th, 2024
- Samsung Display Co., LTD. patent applications on August 22nd, 2024
- SAMSUNG DISPLAY CO., LTD. patent applications on February 1st, 2024
- Samsung Display Co., LTD. patent applications on February 20th, 2025
- SAMSUNG DISPLAY CO., LTD. patent applications on February 8th, 2024
- SAMSUNG DISPLAY CO., LTD. patent applications on January 25th, 2024
- Samsung Display Co., LTD. patent applications on January 9th, 2025
- Samsung Display Co., LTD. patent applications on July 11th, 2024
- Samsung Display Co., Ltd. patent applications on June 20th, 2024
- Samsung Display Co., Ltd. patent applications on March 6th, 2025
- Samsung electronics co., ltd. (20240282573). METHOD AND SYSTEM FOR PROCESSING SUBSTRATES simplified abstract
- Samsung Electronics Co., Ltd. patent applications on August 22nd, 2024
- Samsung Electronics Co., Ltd. patent applications on January 18th, 2024
T
- Taiwan semiconductor manufacturing co., ltd. (20240093357). Semiconductor Device, Method and Machine of Manufacture simplified abstract
- Taiwan semiconductor manufacturing co., ltd. (20250087482). SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF
- Taiwan Semiconductor Manufacturing Co., Ltd. patent applications on March 13th, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd. patent applications on March 21st, 2024
- Taiwan semiconductor manufacturing company, ltd. (20240282571). METHOD FOR MANUFACTURING A SEMICONDUCTOR DEVICE simplified abstract
- Taiwan Semiconductor Manufacturing Company, Ltd. patent applications on August 22nd, 2024
- Tokyo electron limited (20240249951). SUBSTRATE TREATMENT METHOD, SUBSTRATE TREATMENT APPARATUS, AND COMPUTER STORAGE MEDIUM simplified abstract
- Tokyo electron limited (20240295020). METHOD AND APPARATUS FOR EMBEDDING TUNGSTEN INTO RECESS FORMED ON SUBSTRATE simplified abstract
- Tokyo Electron Limited patent applications on July 25th, 2024
- Tokyo Electron Limited patent applications on September 5th, 2024