18914403. Method and system for filling a gap (ASM IP Holding B.V.)
Method and system for filling a gap
Organization Name
Inventor(s)
René Henricus Jozef Vervuurt of Leuven BE
Timothee Blanquart of Oud-Heverlee BE
Ikhlas Rahmat of Leuven Vlaams-Brabant BE
Method and system for filling a gap
This abstract first appeared for US patent application 18914403 titled 'Method and system for filling a gap
Original Abstract Submitted
Disclosed are methods and systems for filing a gap. An exemplary method comprises providing a substrate in a reaction chamber. The substrate comprises at least one gap. The method further comprises depositing a layer into the gap. The layer has a first volume. Finally, the method further comprises converting the layer into a converted layer. The converted layer has a second volume. The second volume is greater than the first volume. The methods and systems are useful, for example, in the field of integrated circuit manufacture.