18396835. METHODS AND ASSEMBLIES FOR SELECTIVELY DEPOSITING MOLYBDENUM simplified abstract (ASM IP Holding B.V.)

METHODS AND ASSEMBLIES FOR SELECTIVELY DEPOSITING MOLYBDENUM

Organization Name

ASM IP Holding B.V.

Inventor(s)

Chiyu Zhu of Helsinki (FI)

Sukanya Datta of Phoenix AZ (US)

Jan Willem Maes of Wilrijk (BE)

METHODS AND ASSEMBLIES FOR SELECTIVELY DEPOSITING MOLYBDENUM - A simplified explanation of the abstract

This abstract first appeared for US patent application 18396835 titled 'METHODS AND ASSEMBLIES FOR SELECTIVELY DEPOSITING MOLYBDENUM

The patent application discusses methods for selectively depositing molybdenum material on a substrate using a cyclic deposition process.

• Providing a substrate in a reaction chamber and performing super-cycles involving halide and oxyhalide sub-cycles.
• The halide sub-cycle includes introducing molybdenum halide precursor into the chamber in vapor form.
• The oxyhalide sub-cycle involves introducing molybdenum oxyhalide precursor into the chamber in vapor form along with a reactant to deposit molybdenum material on the substrate's first surface.

Potential Applications: - Semiconductor manufacturing - Thin film deposition processes - Solar cell production

Problems Solved: - Controlled deposition of molybdenum material - Enhanced substrate surface coverage - Improved adhesion of molybdenum layers

Benefits: - Increased efficiency in material deposition - Precise control over layer thickness - Cost-effective manufacturing processes

Commercial Applications: Molybdenum deposition technology can be utilized in industries such as semiconductor manufacturing, solar panel production, and thin film coating applications. This innovation offers improved efficiency and precision in material deposition processes, leading to cost savings and enhanced product performance.

Questions about Molybdenum Deposition Technology: 1. How does this technology compare to traditional molybdenum deposition methods? 2. What are the key advantages of using a cyclic deposition process for molybdenum material?

Original Abstract Submitted

The disclosure relates to methods of selectively depositing material comprising molybdenum on a first surface of a substrate relative to a second surface of the substrate by a cyclic deposition process. The methods comprise providing a substrate in a reaction chamber, and performing at least one super-cycle comprising a halide sub-cycle and an oxyhalide sub-cycle. The halide sub-cycle comprises providing molybdenum halide precursor into the reaction chamber in a vapor phase, and the oxyhalide sub-cycle comprises providing molybdenum oxyhalide precursor into the reaction chamber in a vapor phase and providing a reactant into the reaction chamber to deposit material comprising molybdenum on the first surface of the substrate. The disclosure further relates to molybdenum layer, to a semiconductor structure and a device, and to vapor deposition assemblies for selectively depositing material comprising molybdenum on a substrate.