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Category:SHIN-ETSU CHEMICAL CO., LTD.
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This category has the following 37 subcategories, out of 37 total.
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Pages in category "SHIN-ETSU CHEMICAL CO., LTD."
The following 89 pages are in this category, out of 89 total.
1
- 18272201. COMPOSITION INCLUDING ORGANOSILICON COMPOUND, RUBBER COMPOUNDING AGENT, AND RUBBER COMPOSITION simplified abstract (SHIN-ETSU CHEMICAL CO., LTD.)
- 18273086. FILM-FORMING MATERIAL, FILM-FORMING SLURRY, SPRAY COATED FILM, AND SPRAY COATED MEMBER simplified abstract (SHIN-ETSU CHEMICAL CO., LTD.)
- 18277804. METHOD FOR MANUFACTURING SURFACE-TREATED SOL-GEL SILICA PARTICLE, SURFACE-TREATED SOL-GEL SILICA PARTICLE, AND TONER EXTERNAL ADDITIVE FOR ELECTROSTATIC CHARGE IMAGE DEVELOPMENT simplified abstract (SHIN-ETSU CHEMICAL CO., LTD.)
- 18278774. COSMETIC simplified abstract (SHIN-ETSU CHEMICAL CO., LTD.)
- 18285406. METHOD FOR PRODUCING LAMINATE, PRODUCING APPARATUS FOR LAMINATE, LAMINATE, AND SEMICONDUCTOR DEVICE simplified abstract (SHIN-ETSU CHEMICAL CO., LTD.)
- 18292218. METHOD FOR MANUFACTURING SPIN WAVE EXCITATION/DETECTION STRUCTURE simplified abstract (SHIN-ETSU CHEMICAL CO., LTD.)
- 18294072. PELLICLE FOR EXPOSURE CAPABLE OF EASY ADJUSTMENT OF ATMOSPHERIC PRESSURE simplified abstract (SHIN-ETSU CHEMICAL CO., LTD.)
- 18294347. NEGATIVE ELECTRODE simplified abstract (SHIN-ETSU CHEMICAL CO., LTD.)
- 18371016. RESIST COMPOSITION AND PATTERN FORMING PROCESS simplified abstract (SHIN-ETSU CHEMICAL CO., LTD.)
- 18376925. ONIUM SALT, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERNING PROCESS simplified abstract (SHIN-ETSU CHEMICAL CO., LTD.)
- 18377215. Onium Salt, Resist Composition, And Patterning Process simplified abstract (SHIN-ETSU CHEMICAL CO., LTD.)
- 18380852. RESIST COMPOSITION AND PATTERN FORMING PROCESS simplified abstract (SHIN-ETSU CHEMICAL CO., LTD.)
- 18426723. SULFONIUM SALT, RESIST COMPOSITION AND PATTERN FORMING PROCESS simplified abstract (SHIN-ETSU CHEMICAL CO., LTD.)
- 18432451. LOW DIELECTRIC SILICA POWDER, RESIN COMPOSITION CONTAINING THE SILICA POWDER, AND METHOD FOR MANUFACTURING LOW DIELECTRIC SILICA POWDER simplified abstract (SHIN-ETSU CHEMICAL CO., LTD.)
- 18436721. ONIUM SALT, RESIST COMPOSITION AND PATTERN FORMING PROCESS simplified abstract (SHIN-ETSU CHEMICAL CO., LTD.)
- 18490857. SULFONIUM SALT, RESIST COMPOSITION AND PATTERN FORMING PROCESS simplified abstract (SHIN-ETSU CHEMICAL CO., LTD.)
- 18493848. ORGANOHALOGEN COMPOUND HAVING CONJUGATED DOUBLE BOND, PROCESS FOR PREPARING ACETATE COMPOUND AND ALCOHOL COMPOUND THEREOF, AND COMPOUND USED TO SYNTHESIZE THE ORGANOHALOGEN COMPOUND simplified abstract (SHIN-ETSU CHEMICAL CO., LTD.)
- 18550027. AQUEOUS DISPERSION OF SILICONE RUBBER PARTICLES AND COSMETICS simplified abstract (SHIN-ETSU CHEMICAL CO., LTD.)
- 18551777. ACRYLIC RESIN EMULSION, PRODUCTION METHOD THEREFOR, AND COATING COMPOSITION simplified abstract (SHIN-ETSU CHEMICAL CO., LTD.)
- 18569125. FURANYL GROUP-CONTAINING ORGANOPOLYSILOXANE AND PRODUCTION METHOD THEREOF simplified abstract (SHIN-ETSU CHEMICAL CO., LTD.)
- 18572967. ORGANOPOLYSILOXANE AND PRODUCTION METHOD THEREOF simplified abstract (SHIN-ETSU CHEMICAL CO., LTD.)
- 18575540. METHOD FOR PRODUCING SILICON MONOXIDE simplified abstract (SHIN-ETSU CHEMICAL CO., LTD.)
- 18576185. PASTE-LIKE SILICONE COMPOSITION, METHOD FOR PRODUCING THE SAME, AND COSMETICS simplified abstract (SHIN-ETSU CHEMICAL CO., LTD.)
- 18588447. Resist Underlayer Film Material, Pattern Forming Method, And Method Of Forming Resist Underlayer Film simplified abstract (SHIN-ETSU CHEMICAL CO., LTD.)
- 18590436. RESIST COMPOSITION AND PATTERN FORMING PROCESS simplified abstract (SHIN-ETSU CHEMICAL CO., LTD.)
- 18590834. RESIST COMPOSITION AND PATTERN FORMING PROCESS simplified abstract (SHIN-ETSU CHEMICAL CO., LTD.)
- 18595636. COSMETIC simplified abstract (SHIN-ETSU CHEMICAL CO., LTD.)
- 18595661. HYDRAULIC COMPOSITION FOR 3D PRINTING AND METHOD OF MANUFACTURING 3D OBJECT simplified abstract (SHIN-ETSU CHEMICAL CO., LTD.)
- 18597253. ONIUM SALT, CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION, AND RESIST PATTERN FORMING PROCESS simplified abstract (SHIN-ETSU CHEMICAL CO., LTD.)
- 18597316. Material For Forming Adhesive Film, Patterning Process, And Method For Forming Adhesive Film simplified abstract (SHIN-ETSU CHEMICAL CO., LTD.)
- 18601039. CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND RESIST PATTERN FORMING PROCESS simplified abstract (SHIN-ETSU CHEMICAL CO., LTD.)
- 18601043. CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION AND RESIST PATTERN FORMING PROCESS simplified abstract (SHIN-ETSU CHEMICAL CO., LTD.)
- 18601541. Method For Forming Resist Underlayer Film And Patterning Process simplified abstract (SHIN-ETSU CHEMICAL CO., LTD.)
- 18611446. Bio-Electrode Composition, Bio-Electrode, And Method For Manufacturing The Same simplified abstract (SHIN-ETSU CHEMICAL CO., LTD.)
- 18616797. REFLECTIVE MASK BLANK, AND MANUFACTURING METHOD OF REFLECTIVE MASK simplified abstract (SHIN-ETSU CHEMICAL CO., LTD.)
- 18698857. ORGANOALKOXYSILANE-CONTAINING COMPOSITION AND METHOD FOR MANUFACTURING THE SAME, AND WATER-ABSORPTION INHIBITOR simplified abstract (SHIN-ETSU CHEMICAL CO., LTD.)
- 18700011. SILICONE-MODIFIED PULLULAN, A COMPOSITION COMPRISING THE SAME, AND A COSMETIC simplified abstract (SHIN-ETSU CHEMICAL CO., LTD.)
- 18712840. ANTENNA MODULE AND MANUFACTURING METHOD THEREOF simplified abstract (SHIN-ETSU CHEMICAL CO., LTD.)
- 18724027. COMPOSITION CONTAINING INORGANIC-ORGANIC HYBRID COMPOUND (SHIN-ETSU CHEMICAL CO., LTD.)
- 18724824. HIGH-CHARACTERISTIC EPITAXIAL GROWTH SUBSTRATE AND METHOD FOR MANUFACTURING SAME (SHIN-ETSU CHEMICAL CO., LTD.)
- 18725253. FILM FORMING APPARATUS AND FILM FORMING METHOD (SHIN-ETSU CHEMICAL CO., LTD.)
- 18728300. THIXOTROPIC SILICONE GEL COMPOSITION, SILICONE GEL CURED PRODUCT, AND ELECTRICAL/ELECTRONIC COMPONENTS (SHIN-ETSU CHEMICAL CO., LTD.)
- 18729114. PERFLUOROPOLYETHER-ORGANOPOLYSILOXANE BLOCK COPOLYMER (SHIN-ETSU CHEMICAL CO., LTD.)
- 18730005. NEGATIVE ELECTRODE ACTIVE MATERIAL FOR NON-AQUEOUS ELECTROLYTE SECONDARY BATTERY, METHOD FOR PRODUCING SAME (SHIN-ETSU CHEMICAL CO., LTD.)
- 18730141. HYDROPHILIC COPOLYMER AND HYDROPHILIC COMPOSITION (SHIN-ETSU CHEMICAL CO., LTD.)
- 18745287. NEGATIVE ELECTRODE ACTIVE MATERIAL AND METHOD FOR PRODUCING THE SAME simplified abstract (SHIN-ETSU CHEMICAL CO., LTD.)
- 18823930. REFLECTIVE MASK BLANK AND MANUFACTURING METHOD OF REFLECTIVE MASK (SHIN-ETSU CHEMICAL CO., LTD.)
- 18829435. RESIST COMPOSITION AND PATTERN FORMING PROCESS (SHIN-ETSU CHEMICAL CO., LTD.)
- 18829508. RESIST COMPOSITION AND PATTERN FORMING PROCESS (SHIN-ETSU CHEMICAL CO., LTD.)
- 18835087. THERMALLY CONDUCTIVE SILICONE COMPOSITION AND PRODUCTION METHOD THEREFOR (SHIN-ETSU CHEMICAL CO., LTD.)
- 18835580. CRYSTALLINE OXIDE FILM, LAMINATED STRUCTURE, SEMICONDUCTOR DEVICE, AND METHOD FOR PRODUCING CRYSTALLINE OXIDE FILM (SHIN-ETSU CHEMICAL CO., LTD.)
- 18835812. THERMAL CONDUCTIVE SILICONE COMPOSITION (SHIN-ETSU CHEMICAL CO., LTD.)
- 18884484. PHOTOSENSITIVE RESIN COMPOSITION AND PATTERN FORMING PROCESS (SHIN-ETSU CHEMICAL CO., LTD.)
- 18893066. Composition For Forming Metal-Containing Film And Patterning Process (SHIN-ETSU CHEMICAL CO., LTD.)
- 18899399. FLUORENE SKELETON-CONTAINING POLYMER (SHIN-ETSU CHEMICAL CO., LTD.)
- 18902894. RESIST COMPOSITION AND PATTERN FORMING PROCESS (SHIN-ETSU CHEMICAL CO., LTD.)
- 18903164. RESIST COMPOSITION AND PATTERN FORMING PROCESS (SHIN-ETSU CHEMICAL CO., LTD.)
- 18903533. ONIUM SALT MONOMER, POLYMER, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERN FORMING PROCESS (SHIN-ETSU CHEMICAL CO., LTD.)
- 18904560. RESIST COMPOSITION AND PATTERN FORMING PROCESS (SHIN-ETSU CHEMICAL CO., LTD.)
- 18904577. RESIST COMPOSITION AND PATTERN FORMING PROCESS (SHIN-ETSU CHEMICAL CO., LTD.)
- 18908930. Composition For Forming Resist Underlayer Film, Resist Underlayer Film, Method For Manufacturing Resist Underlayer Film, Patterning Process, And Method For Manufacturing Semiconductor Device (SHIN-ETSU CHEMICAL CO., LTD.)
- 18912771. COMPOSITION FOR FORMING ORGANIC FILM, METHOD FOR FORMING ORGANIC FILM, PATTERNING PROCESS, AND POLYMER (SHIN-ETSU CHEMICAL CO., LTD.)
2
- 20250163206. Siloxane-modified (SHIN-ETSU CHEMICAL ., .)
- 20250163238. Carbon Black Disp (SHIN-ETSU CHEMICAL ., .)
- 20250164878. Resist Compositio (SHIN-ETSU CHEMICAL ., .)
- 20250164882. Positive Resist C (SHIN-ETSU CHEMICAL ., .)
- 20250166999. Patterning Proces (SHIN-ETSU CHEMICAL ., .)
- 20250178955. Glass Cloth Treat (SHIN-ETSU CHEMICAL ., .)
- 20250179251. Composition Compr (SHIN-ETSU CHEMICAL ., .)
- 20250186331. Cosmetic (SHIN-ETSU CHEMICAL ., .)
- 20250186984. Method Produc (SHIN-ETSU CHEMICAL ., .)
- 20250188224. Method Produc (SHIN-ETSU CHEMICAL ., .)
- 20250188225. Thermally-conduct (SHIN-ETSU CHEMICAL ., .)
- 20250205140. Surfactant Co (SHIN-ETSU CHEMICAL ., .)
- 20250206888. Photoreactive Org (SHIN-ETSU CHEMICAL ., .)
- 20250206948. Condensation-cura (SHIN-ETSU CHEMICAL ., .)
- 20250229280. Film Forming Meth (SHIN-ETSU CHEMICAL ., .)
- 20250230109. Process Prepa (SHIN-ETSU CHEMICAL ., .)
- 20250231480. Resist Compositio (SHIN-ETSU CHEMICAL ., .)
- 20250231482. Positive Resist M (SHIN-ETSU CHEMICAL ., .)
- 20250231483. Resist Compositio (SHIN-ETSU CHEMICAL ., .)
- 20250231485. Compound Form (SHIN-ETSU CHEMICAL ., .)
- 20250231486. Composition F (SHIN-ETSU CHEMICAL ., .)
- 20250231487. Composition F (SHIN-ETSU CHEMICAL ., .)
- 20250232984. Composition F (SHIN-ETSU CHEMICAL ., .)