18903164. RESIST COMPOSITION AND PATTERN FORMING PROCESS (SHIN-ETSU CHEMICAL CO., LTD.)
RESIST COMPOSITION AND PATTERN FORMING PROCESS
Organization Name
Inventor(s)
Jun Hatakeyama of Joetsu-shi JP
Takayuki Fujiwara of Joetsu-shi JP
RESIST COMPOSITION AND PATTERN FORMING PROCESS
This abstract first appeared for US patent application 18903164 titled 'RESIST COMPOSITION AND PATTERN FORMING PROCESS
Original Abstract Submitted
A resist composition comprising a bisonium salt containing a divalent anion having a sulfonate anion structure having a fluorine atom or a trifluoromethyl group at ι- or β-position and linked to an aromatic group having an iodine atom or a bromine atom and a sulfonimide anion structure or a sulfonamide anion structure bonded to the aromatic group having an iodine atom or a bromine atom, via a linking group having 1 or more carbon atoms, and an onium cation.