COMPOSITION FOR FORMING ORGANIC FILM, METHOD FOR FORMING ORGANIC FILM, PATTERNING PROCESS, AND SURFACTANT

Abstract: a composition for forming an organic film contains: (a) a material for forming an organic film; (b) an aryl benzyl ether compound having a partial structure represented by the following general formula (b1); and (c) a solvent, where rrepresents a group represented by the following formula (b2-1) or either of groups containing fluorine represented by the following formulae (b2-2), rrepresents a saturated or unsaturated monovalent organic group having 1 to 30 carbon atoms, “a” represents 0 or 1, provided that when “a” is 0, “b” represents 1 to 5 and “c” represents 0 to 4, and when “a” is 1, “b” represents 1 to 7 and “c” represents 0 to 6, and “*” represents an attachment point to another atom.

Inventor(s): Keisuke NIIDA, Yasuyuki Yamamoto

CPC Classification: H01L21/31144 ({using masks})

Search for rejections for patent application number 20250232984