FILM FORMING METHOD, FILM FORMING APPARATUS, AND LAMINATE

Abstract: a forming method includes atomizing a raw material solution to form a raw material mist, mixing raw material mist and carrier gas to form a gas mixture, placing substrate on a stage, forming a film on the substrate by supplying gas mixture to substrate from a gas mixture supply means, and exhausting gas mixture after the film formation by exhaust means, in which a channel plate is arranged above substrate and faces the substrate via a space, a gas mixture flow is formed in the space above the substrate flowing linearly from the gas mixture supply means to the exhaust means such that the gas mixture flow flows along at least a part of a main surface of the substrate, and in the forming step and the exhausting step, at least a temperature t of the gas mixture supply means, and a temperature t of the channel plate are controlled.

Inventor(s): Hiroshi HASHIGAMI

CPC Classification: B05B7/0416 (SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES (spray-mixers with nozzles ; processes for applying liquids or other fluent materials to surfaces by spraying ))

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