18829508. RESIST COMPOSITION AND PATTERN FORMING PROCESS (SHIN-ETSU CHEMICAL CO., LTD.)
RESIST COMPOSITION AND PATTERN FORMING PROCESS
Organization Name
Inventor(s)
Jun Hatakeyama of Joetsu-shi JP
Takayuki Fujiwara of Joetsu-shi JP
RESIST COMPOSITION AND PATTERN FORMING PROCESS
This abstract first appeared for US patent application 18829508 titled 'RESIST COMPOSITION AND PATTERN FORMING PROCESS
Original Abstract Submitted
The resist composition comprises an onium salt of sulfonic acid which has a linkage of two iodized or brominated aromatic groups as the acid generator. The resist composition offers a high sensitivity, reduced LWR and improved CDU independent of whether it is of positive or negative tone. A pattern can be formed by using the resist composition.