18829435. RESIST COMPOSITION AND PATTERN FORMING PROCESS (SHIN-ETSU CHEMICAL CO., LTD.)
RESIST COMPOSITION AND PATTERN FORMING PROCESS
Organization Name
Inventor(s)
Jun Hatakeyama of Joetsu-shi JP
Takayuki Fujiwara of Joetsu-shi JP
RESIST COMPOSITION AND PATTERN FORMING PROCESS
This abstract first appeared for US patent application 18829435 titled 'RESIST COMPOSITION AND PATTERN FORMING PROCESS
Original Abstract Submitted
A resist composition comprises an onium salt of aromatic sulfonic acid having a linkage of two iodized or brominated aromatic groups as the acid generator is provided. The resist composition offers a high sensitivity, reduced LWR and improved CDU independent of whether it is of positive or negative tone. A pattern can be formed by using the resist composition.