Pages that link to "Category:Applied materials, inc."

The following pages link to Category:Applied materials, inc.:

Displaying 50 items.

• Applied materials, inc. (20240247113). METHOD OF FORMING AN AQUEOUS POLYMER COMPOSITION simplified abstract (← links)
• Applied materials, inc. (20240247362). NOZZLE FOR A DISTRIBUTOR OF A MATERIAL DEPOSITION SOURCE, MATERIAL DEPOSITION SOURCE, VACUUM DEPOSITION SYSTEM AND METHOD FOR DEPOSITING MATERIAL simplified abstract (← links)
• Applied materials, inc. (20240247365). MULTICATHODE PVD SYSTEM FOR HIGH ASPECT RATIO BARRIER SEED DEPOSITION simplified abstract (← links)
• Applied materials, inc. (20240247370). ATOMIC LAYER DEPOSITION OF RUTHENIUM OXIDE COATINGS simplified abstract (← links)
• Applied materials, inc. (20240247371). SEMICONDUCTOR PROCESSING CHAMBERS AND METHODS FOR CLEANING THE SAME simplified abstract (← links)
• Applied materials, inc. (20240247373). ADJUSTABLE CROSS-FLOW PROCESS CHAMBER LID simplified abstract (← links)
• Applied materials, inc. (20240247374). PRECURSOR DELIVERY SYSTEM FOR SEMICONDUCTOR DEVICE FORMATION simplified abstract (← links)
• Applied materials, inc. (20240247376). Fluorinated Aluminum Coated Component for a Substrate Processing Apparatus and Method of Producing simplified abstract (← links)
• Applied materials, inc. (20240247379). FORMATION OF METALLIC FILMS ON ELECTROLESS METAL PLATING OF SURFACES simplified abstract (← links)
• Applied materials, inc. (20240247404). PRE-HEAT RINGS AND PROCESSING CHAMBERS INCLUDING BLACK QUARTZ, AND RELATED METHODS simplified abstract (← links)
• Applied materials, inc. (20240247405). METHOD FOR CONTROLLING LAYER-TO-LAYER THICKNESS IN MULTI-TIER EPITAXIAL PROCESS simplified abstract (← links)
• Applied materials, inc. (20240247407). INDIUM-GALLIUM-NITRIDE LIGHT EMITTING DIODES WITH INCREASED QUANTUM EFFICIENCY simplified abstract (← links)
• Applied materials, inc. (20240248046). MULTI-HEAD OPTICAL INSPECTION SYSTEMS AND TECHNIQUES FOR SEMICONDUCTOR MANUFACTURING simplified abstract (← links)
• Applied materials, inc. (20240248282). APPARATUS AND METHODS FOR HEATING TUNABILITY IN PROCESSING CHAMBERS simplified abstract (← links)
• Applied materials, inc. (20240248297). APPARATUS AND METHODS FOR HEATING TUNABILITY IN PROCESSING CHAMBERS simplified abstract (← links)
• Applied materials, inc. (20240248298). APPARATUS AND METHODS FOR HEATING TUNABILITY IN PROCESSING CHAMBERS simplified abstract (← links)
• Applied materials, inc. (20240248339). FLEXIBLE MULTI-LAYERED COVER LENS STACKS FOR FOLDABLE DISPLAYS simplified abstract (← links)
• Applied materials, inc. (20240248466). PROCESS CHAMBER QUALIFICATION FOR MAINTENANCE PROCESS ENDPOINT DETECTION simplified abstract (← links)
• Applied materials, inc. (20240249052). SYSTEMS AND METHODS FOR PREDICTING FILM THICKNESS USING VIRTUAL METROLOGY simplified abstract (← links)
• Applied materials, inc. (20240249062). OVERLAYING ON LOCALLY DISPOSITIONED PATTERNS BY ML BASED DYNAMIC DIGITAL CORRECTIONS (ML-DDC) simplified abstract (← links)
• Applied materials, inc. (20240249904). Ion Source For Controlling Decomposition Buildup Using Chlorine Co-Gas simplified abstract (← links)
• Applied materials, inc. (20240249908). Dose Cup Assembly for an Ion Implanter simplified abstract (← links)
• Applied materials, inc. (20240249915). PLASMA EXCITATION WITH ION ENERGY CONTROL simplified abstract (← links)
• Applied materials, inc. (20240249918). Processing Chamber With Multiple Plasma Units simplified abstract (← links)
• Applied materials, inc. (20240249920). REMOVABLE MASK LAYER TO REDUCE OVERHANG DURING RE-SPUTTER PROCESS IN PVD CHAMBERS simplified abstract (← links)
• Applied materials, inc. (20240249924). BIPOLAR ELECTROSTATIC CHUCK ELECTRODE DESIGNS simplified abstract (← links)
• Applied materials, inc. (20240249934). INTEGRATED METHOD AND TOOL FOR HIGH QUALITY SELECTIVE SILICON NITRIDE DEPOSITION simplified abstract (← links)
• Applied materials, inc. (20240249936). METHODS FOR REDUCING MICRO AND MACRO SCALLOPING ON SEMICONDUCTOR DEVICES simplified abstract (← links)
• Applied materials, inc. (20240249953). DRY ETCH OF BORON-CONTAINING MATERIAL simplified abstract (← links)
• Applied materials, inc. (20240249965). SUBSTRATE SUPPORT CARRIER HAVING MULTIPLE CERAMIC DISCS simplified abstract (← links)
• Applied materials, inc. (20240251546). DRAM Transistor Including Pillars Formed Using Low-Temperature Ion Implant simplified abstract (← links)
• Applied materials, inc. (20240253179). POLISHING HEAD WITH LOCAL WAFER PRESSURE simplified abstract (← links)
• Applied materials, inc. (20240253183). APPARATUS AND METHOD FOR CONTROLLING SUBSTRATE POLISH EDGE UNIFORMITY simplified abstract (← links)
• Applied materials, inc. (20240253968). LIQUID LITHIUM SUPPLY AND REGULATION simplified abstract (← links)
• Applied materials, inc. (20240254624). PLATE ASSEMBLIES, PROCESS KITS, AND PROCESSING CHAMBERS FOR SEMICONDUCTOR MANUFACTURING simplified abstract (← links)
• Applied materials, inc. (20240254627). INJECTORS, LINERS, PROCESS KITS, PROCESSING CHAMBERS, AND RELATED METHODS FOR GAS FLOW IN BATCH PROCESSING OF SEMICONDUCTOR MANUFACTURING simplified abstract (← links)
• Applied materials, inc. (20240254645). LOW TEMPERATURE HYBRID BONDING METALLIZATION simplified abstract (← links)
• Applied materials, inc. (20240254653). CELL ARCHITECTURAL STRUCTURES FOR ENHANCED THERMAL MANAGEMENT IN EPITAXIAL GROWTH PROCESSING CHAMBER simplified abstract (← links)
• Applied materials, inc. (20240254654). EPI ISOLATION PLATE WITH GAP AND ANGLE ADJUSTMENT FOR PROCESS TUNING simplified abstract (← links)
• Applied materials, inc. (20240254655). EPI ISOLATION PLATE AND PARALLEL BLOCK PURGE FLOW TUNING FOR GROWTH RATE AND UNIFORMITY simplified abstract (← links)
• Applied materials, inc. (20240255700). SURFACE ROUGHNESS REDUCTION FOR PHOTONICS USING HIGH-TEMPERATURE IMPLANTATION simplified abstract (← links)
• Applied materials, inc. (20240258070). PLASMA UNIFORMITY CONTROL SYSTEM AND METHODS simplified abstract (← links)
• Applied materials, inc. (20240258075). SUBSTRATE SUPPORT WITH REAL TIME FORCE AND FILM STRESS CONTROL simplified abstract (← links)
• Applied materials, inc. (20240258076). SPRAY-COATED ELECTROSTATIC CHUCK DESIGN simplified abstract (← links)
• Applied materials, inc. (20240258097). PURGE SYSTEM TO CLEAN WAFER BACKSIDE FOR RING SUSCEPTOR simplified abstract (← links)
• Applied materials, inc. (20240258103). PLASMA TREATMENT OF BARRIER AND LINER LAYERS simplified abstract (← links)
• Applied materials, inc. (20240258106). SUBSTRATE PROCESSING FOR AlN AND GaN POLARITY CONTROL simplified abstract (← links)
• Applied materials, inc. (20240258109). METHOD OF DEPOSITING A TUNGSTEN CONTAINING LAYER simplified abstract (← links)
• Applied materials, inc. (20240258116). SYSTEMS AND METHODS FOR TITANIUM-CONTAINING FILM REMOVAL simplified abstract (← links)
• Applied materials, inc. (20240258136). SUBSTRATE PROCESSING MODULE AND METHOD OF MOVING A WORKPIECE simplified abstract (← links)