ATOMIC LAYER DEPOSITION OF RUTHENIUM OXIDE COATINGS

Organization Name

applied materials, inc.

Inventor(s)

Jeffrey W. Anthis of Redwood City CA (US)

Nasrin Kazem of Santa Clara CA (US)

Lakmal Charidu Kalutarage of San Jose CA (US)

Jayden Stephen John Shackerley Potter of Menlo Park CA (US)

Thomas Joseph Knisley of Livonia MI (US)

Lisa Enman of Sunnyvale CA (US)

ATOMIC LAYER DEPOSITION OF RUTHENIUM OXIDE COATINGS - A simplified explanation of the abstract

This abstract first appeared for US patent application 20240247370 titled 'ATOMIC LAYER DEPOSITION OF RUTHENIUM OXIDE COATINGS

Simplified Explanation: The patent application describes a method of depositing a coating of stoichiometric one-to-one ruthenium oxide (RuO) onto a substrate surface using atomic layer deposition (ALD) with at least one precursor.

Key Features and Innovation:

Deposition of a coating of stoichiometric one-to-one ruthenium oxide (RuO) onto a substrate surface.
Utilization of atomic layer deposition (ALD) process with at least one precursor.

Potential Applications: The technology can be applied in various industries such as electronics, energy storage, and catalysis.

Problems Solved: The technology addresses the need for precise and controlled deposition of ruthenium oxide coatings on substrates.

Benefits:

Enhanced performance of electronic devices.
Improved energy storage capabilities.
Increased efficiency in catalytic processes.

Commercial Applications: The technology can be used in the production of advanced electronic devices, energy storage systems, and catalysts, potentially impacting the market in these sectors.

Questions about Ruthenium Oxide Deposition: 1. How does the atomic layer deposition process improve the quality of the ruthenium oxide coating? 2. What are the specific advantages of using stoichiometric one-to-one ruthenium oxide in various applications?

Frequently Updated Research: Stay updated on the latest advancements in atomic layer deposition techniques for ruthenium oxide coatings to ensure optimal performance and efficiency in various applications.

Original Abstract Submitted

a method includes depositing a coating including stoichiometric one-to-one ruthenium oxide (ruo) onto a surface of a substrate. the coating is deposited by performing an atomic layer deposition (ald) process using at least one precursor.