Applied materials, inc. (20240249915). PLASMA EXCITATION WITH ION ENERGY CONTROL simplified abstract
PLASMA EXCITATION WITH ION ENERGY CONTROL
Organization Name
Inventor(s)
Yang Yang of San Diego CA (US)
Yue Guo of Redwood City CA (US)
Kartik Ramaswamy of San Jose CA (US)
PLASMA EXCITATION WITH ION ENERGY CONTROL - A simplified explanation of the abstract
This abstract first appeared for US patent application 20240249915 titled 'PLASMA EXCITATION WITH ION ENERGY CONTROL
The abstract of this patent application describes apparatus, plasma processing systems, and methods for generating a waveform for plasma processing of a substrate in a processing chamber. One embodiment includes a waveform generator with a voltage source selectively coupled to an output node, which is connected to an electrode in the processing chamber and can be selectively grounded. The waveform generator also includes a radio frequency (RF) signal generator and a filter between the RF signal generator and the output node.
- The patent application describes a waveform generator for plasma processing systems.
- The waveform generator includes a voltage source, an output node, and a radio frequency signal generator.
- The output node is connected to an electrode in the processing chamber and can be grounded.
- A filter is included to ensure proper signal generation and delivery to the electrode.
- This technology aims to improve the efficiency and effectiveness of plasma processing for substrates.
Potential Applications: - Semiconductor manufacturing - Thin film deposition - Surface cleaning and modification processes
Problems Solved: - Inefficient plasma processing - Lack of control over waveform generation - Inconsistent results in substrate processing
Benefits: - Enhanced control over plasma processing parameters - Improved substrate processing efficiency - Consistent and reliable results in plasma processing
Commercial Applications: Plasma processing equipment manufacturers can integrate this technology into their systems to offer more precise and efficient plasma processing solutions to their customers.
Questions about Plasma Processing Waveform Generation: 1. How does the waveform generator improve the efficiency of plasma processing? 2. What are the potential applications of this technology in the semiconductor industry?
Frequently Updated Research: Researchers are continually exploring new waveform generation techniques to further enhance the capabilities of plasma processing systems. Stay updated on the latest advancements in this field to leverage the most cutting-edge technologies for substrate processing.
Original Abstract Submitted
embodiments provided herein generally include apparatus, plasma processing systems and methods for generation of a waveform for plasma processing of a substrate in a processing chamber. one embodiment includes a waveform generator having a voltage source selectively coupled to an output node, where the output node is configured to be coupled to an electrode disposed within a processing chamber, and where the output node is selectively coupled to a ground node. the waveform generator may also include a radio frequency (rf) signal generator, and a first filter coupled between the rf signal generator and the output node.
