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Category:CPC H10D64/021
Pages in category "CPC H10D64/021"
The following 43 pages are in this category, out of 43 total.
1
- 18368014. SEMICONDUCTOR DEVICE STRUCTURE AND METHODS OF FORMING THE SAME (Taiwan Semiconductor Manufacturing Co., Ltd.)
- 18370287. INTEGRATED CIRCUIT STRUCTURES WITH PATCH SPACERS (Intel Corporation)
- 18374668. SEMICONDUCTOR DEVICE STRUCTURE AND METHODS OF FORMING THE SAME (Taiwan Semiconductor Manufacturing Co., Ltd.)
- 18381555. SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF (TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.)
- 18424791. GATE SIDEWALL STRUCTURES OF SEMICONDUCTOR DEVICES AND METHODS OF FORMING THE SAME (Taiwan Semiconductor Manufacturing Co., Ltd.)
- 18473803. MULTI-LAYER DIELECTRIC GATE SPACER FOR FIN FIELD EFFECT TRANSISTORS (FINFET) AND GATE-ALL-AROUND (GAA) DEVICES (QUALCOMM Incorporated)
- 18611923. TRANSISTOR STACKS HAVING INSULATING SPACERS, AND RELATED FABRICATION METHODS (Samsung Electronics Co., Ltd.)
- 18893455. SEMICONDUCTOR AIRGAP SPACER AND FABRICATION METHODS (Applied Materials, Inc.)
- 18985150. METHOD AND RELATED APPARATUS FOR REDUCING GATE-INDUCED DRAIN LEAKAGE IN SEMICONDUCTOR DEVICES (Taiwan Semiconductor Manufacturing Co., Ltd.)
2
A
I
- Intel corporation (20250098260). INTEGRATED CIRCUIT STRUCTURES WITH PATCH SPACERS
- INTEL CORPORATION Patent Application Trends in 2025
- Intel Corporation Patent Application Trends in 2025
- Intel Corporation patent applications on March 20th, 2025
- International Business Machines Corporation Patent Application Trends in 2025
Q
- Qualcomm incorporated (20250107200). MULTI-LAYER DIELECTRIC GATE SPACER FOR FIN FIELD EFFECT TRANSISTORS (FINFET) AND GATE-ALL-AROUND (GAA) DEVICES
- Qualcomm Incorporated Patent Application Trends in 2025
- Qualcomm incorporated Patent Application Trends in 2025
- QUALCOMM Incorporated patent applications on March 27th, 2025
S
T
- Taiwan semiconductor manufacturing co., ltd. (20250098259). SEMICONDUCTOR DEVICE STRUCTURE AND METHODS OF FORMING THE SAME
- Taiwan semiconductor manufacturing co., ltd. (20250098261). GATE SIDEWALL STRUCTURES OF SEMICONDUCTOR DEVICES AND METHODS OF FORMING THE SAME
- Taiwan semiconductor manufacturing co., ltd. (20250113576). SEMICONDUCTOR DEVICE STRUCTURE AND METHODS OF FORMING THE SAME
- Taiwan semiconductor manufacturing co., ltd. (20250120153). METHOD AND RELATED APPARATUS FOR REDUCING GATE-INDUCED DRAIN LEAKAGE IN SEMICONDUCTOR DEVICES
- TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. Patent Application Trends in 2025
- Taiwan Semiconductor Manufacturing Co., Ltd. patent applications on April 10th, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd. patent applications on April 3rd, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd. patent applications on March 20th, 2025
- TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD. Patent Application Trends in 2025
- Taiwan Semiconductor Manufacturing Company Patent Application Trends in 2025
- Taiwan semiconductor manufacturing company, ltd. (20250133800). SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF
- Taiwan Semiconductor Manufacturing Company, Ltd. Patent Application Trends in 2025
- TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. Patent Application Trends in 2025
- TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. patent applications on April 24th, 2025