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Category:G03F7/38
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This category has the following 21 subcategories, out of 21 total.
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Pages in category "G03F7/38"
The following 68 pages are in this category, out of 68 total.
1
- 17841031. PHOTORESIST COMPOSITION AND METHOD OF MANUFACTURING INTEGRATED CIRCUIT DEVICE BY USING THE SAME simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)
- 18155955. PHOTORESIST AND FORMATION METHOD THEREOF simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.)
- 18298114. METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE simplified abstract (TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.)
- 18300859. ADDITIVE FOR LITHOGRAPHY simplified abstract (TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.)
- 18335852. PHOTO LIGAND DESIGN FOR EUV OR E-BEAM METALLIC PHOTORESISTS (Taiwan Semiconductor Manufacturing Co., Ltd.)
- 18336217. SUBSTRATE CLEANING CHAMBER, A SUBSTRATE PROCESSING SYSTEM INCLUDING THE SAME, AND A METHOD OF PROCESSING A SUBSTRATE USING THE SUBSTRATE PROCESSING SYSTEM simplified abstract (Samsung Electronics Co., Ltd.)
- 18344992. PHOTORESIST TOPCOAT COMPOSITION, AND METHOD OF FORMING PATTERNS USING THE COMPOSITION simplified abstract (Samsung Electronics Co., Ltd.)
- 18375031. SWITCHABLE UNDERLAYERS FOR EUV LITHOGRAPHY (INTEL CORPORATION)
- 18403982. BIASABLE ELECTROSTATIC CHUCK simplified abstract (Applied Materials, Inc.)
- 18404434. PHOTORESIST UNDERLAYER MATERIALS AND ASSOCIATED METHODS (Taiwan Semiconductor Manufacturing Co., Ltd.)
- 18432182. METHOD OF FORMING PHOTORESIST PATTERNS AND BAKING EQUIPMENT (SAMSUNG ELECTRONICS CO., LTD.)
- 18505474. SUBSTRATE PROCESSING APPARATUS AND SEMICONDUCTOR MANUFACTURING EQUIPMENT INCLUDING THE SAME simplified abstract (SEMES CO., LTD.)
- 18599619. SUBSTRATE TRANSFER METHOD AND SUBSTRATE TRANSFER APPARATUS simplified abstract (Tokyo Electron Limited)
- 18609833. PHOTORESIST COMPOSITION AND METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.)
- 18663843. METHOD OF REDUCING UNDESIRED LIGHT INFLUENCE IN EXTREME ULTRAVIOLET EXPOSURE simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.)
- 18738731. METHOD TO REDUCE DEFECTS POST-SEQUENTIAL INFILTRATION SYNTHESIS (Applied Materials, Inc.)
- 18964266. PHOTORESIST COMPOSITION AND METHOD OF FORMING PHOTORESIST PATTERN (Taiwan Semiconductor Manufacturing Co., Ltd.)
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- Fujifilm corporation (20240427243). ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, METHOD FOR PRODUCING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE
- Fujifilm corporation (20250004374). ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, METHOD FOR PRODUCING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE
- FUJIFILM CORPORATION patent applications on December 26th, 2024
- FUJIFILM CORPORATION patent applications on January 2nd, 2025
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- Intel corporation (20240201586). PRECURSORS AND METHODS FOR PRODUCING TIN-BASED PHOTORESIST simplified abstract
- Intel corporation (20250110408). SWITCHABLE UNDERLAYERS FOR EUV LITHOGRAPHY
- Intel Corporation patent applications on April 3rd, 2025
- INTEL CORPORATION patent applications on April 3rd, 2025
- Intel Corporation patent applications on June 20th, 2024
- INTEL CORPORATION patent applications on June 20th, 2024
S
- Samsung Display Co., LTD. patent applications on February 20th, 2025
- Samsung electronics co., ltd. (20240173751). SUBSTRATE CLEANING CHAMBER, A SUBSTRATE PROCESSING SYSTEM INCLUDING THE SAME, AND A METHOD OF PROCESSING A SUBSTRATE USING THE SUBSTRATE PROCESSING SYSTEM simplified abstract
- Samsung electronics co., ltd. (20240210832). PHOTORESIST TOPCOAT COMPOSITION, AND METHOD OF FORMING PATTERNS USING THE COMPOSITION simplified abstract
- Samsung electronics co., ltd. (20240255848). SEMICONDUCTOR PHOTORESIST COMPOSITION AND METHOD OF FORMING PATTERNS USING THE COMPOSITION simplified abstract
- Samsung electronics co., ltd. (20250004381). METHOD OF FORMING PHOTORESIST PATTERNS AND BAKING EQUIPMENT
- Samsung Electronics Co., Ltd. patent applications on August 1st, 2024
- Samsung Electronics Co., Ltd. patent applications on January 2nd, 2025
- SAMSUNG ELECTRONICS CO., LTD. patent applications on January 2nd, 2025
- Samsung Electronics Co., Ltd. patent applications on June 27th, 2024
- Samsung Electronics Co., Ltd. patent applications on May 30th, 2024
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- Taiwan semiconductor manufacturing co., ltd. (20240419069). PHOTO LIGAND DESIGN FOR EUV OR E-BEAM METALLIC PHOTORESISTS
- Taiwan semiconductor manufacturing co., ltd. (20240429051). PHOTORESIST AND FORMATION METHOD THEREOF
- Taiwan semiconductor manufacturing co., ltd. (20250085631). PHOTORESIST UNDERLAYER MATERIALS AND ASSOCIATED METHODS
- Taiwan semiconductor manufacturing co., ltd. (20250093775). PHOTORESIST COMPOSITION AND METHOD OF FORMING PHOTORESIST PATTERN
- Taiwan Semiconductor Manufacturing Co., Ltd. patent applications on December 19th, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd. patent applications on December 26th, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd. patent applications on March 13th, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd. patent applications on March 20th, 2025
- Taiwan semiconductor manufacturing company, ltd. (20240242966). PHOTORESIST AND FORMATION METHOD THEREOF simplified abstract
- Taiwan semiconductor manufacturing company, ltd. (20240280903). PHOTORESIST COMPOSITION AND METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE simplified abstract
- Taiwan semiconductor manufacturing company, ltd. (20240295820). METHOD OF REDUCING UNDESIRED LIGHT INFLUENCE IN EXTREME ULTRAVIOLET EXPOSURE simplified abstract
- Taiwan semiconductor manufacturing company, ltd. (20240337947). METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE simplified abstract
- Taiwan semiconductor manufacturing company, ltd. (20240345485). ADDITIVE FOR LITHOGRAPHY simplified abstract
- Taiwan semiconductor manufacturing company, ltd. (20240377743). BOTTOM ANTIREFLECTIVE COATING MATERIALS simplified abstract
- Taiwan Semiconductor Manufacturing Company, Ltd. patent applications on August 22nd, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd. patent applications on July 18th, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd. patent applications on November 14th, 2024
- TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. patent applications on October 10th, 2024
- TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. patent applications on October 17th, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd. patent applications on September 5th, 2024
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- US Patent Application 18232264. PHOTORESIST COMPOSITION AND METHOD FOR MANUFACTURING A SEMICONDUCTOR DEVICE simplified abstract
- US Patent Application 18232717. PHOTORESIST UNDER-LAYER AND METHOD OF FORMING PHOTORESIST PATTERN simplified abstract
- US Patent Application 18232774. UNDERLAYER COMPOSITION AND METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE simplified abstract
- US Patent Application 18361402. BOTTOM ANTIREFLECTIVE COATING MATERIALS simplified abstract
- US Patent Application 18447104. APPARATUS, SYSTEM AND METHOD simplified abstract
- US Patent Application 18447441. PHOTORESIST WITH POLAR-ACID-LABILE-GROUP simplified abstract