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Category:CPC G03F7/0045
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Pages in category "CPC G03F7/0045"
The following 71 pages are in this category, out of 71 total.
1
- 18112803. FABRICATION OF EUV MASKS USING A COMBINATION OF MONOLAYER LITHOGRAPHY AND AREA SELECTIVE DEPOSITION simplified abstract (International Business Machines Corporation)
- 18192316. ORGANIC SALT, PHOTORESIST COMPOSITION INCLUDING THE SAME, AND PATTERN FORMATION METHOD USING THE SAME simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)
- 18277589. QUANTUM DOT MIXTURE, QUANTUM DOT LIGHT EMITTING LAYER AND PREPARATION METHOD THEREOF (BOE TECHNOLOGY GROUP CO., LTD.)
- 18403927. PHOTORESIST COMPOSITION AND METHOD OF MANUFACTURING INTEGRATED CIRCUIT DEVICE BY USING THE SAME simplified abstract (Samsung Electronics Co., Ltd.)
- 18404506. ONIUM SALT, CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION, AND RESIST PATTERN FORMING PROCESS simplified abstract (Shin-Etsu Chemical Co., Ltd.)
- 18421949. ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND COMPOUND simplified abstract (FUJIFILM Corporation)
- 18426723. SULFONIUM SALT, RESIST COMPOSITION AND PATTERN FORMING PROCESS simplified abstract (SHIN-ETSU CHEMICAL CO., LTD.)
- 18436721. ONIUM SALT, RESIST COMPOSITION AND PATTERN FORMING PROCESS simplified abstract (SHIN-ETSU CHEMICAL CO., LTD.)
- 18586593. ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND COMPOUND simplified abstract (FUJIFILM Corporation)
- 18589918. PHOTORESIST COMPOSITION AND METHOD OF MANUFACTURING INTEGRATED CIRCUIT DEVICE USING THE SAME simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)
- 18590834. RESIST COMPOSITION AND PATTERN FORMING PROCESS simplified abstract (SHIN-ETSU CHEMICAL CO., LTD.)
- 18597253. ONIUM SALT, CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION, AND RESIST PATTERN FORMING PROCESS simplified abstract (SHIN-ETSU CHEMICAL CO., LTD.)
- 18610965. ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN simplified abstract (FUJIFILM Corporation)
- 18613810. ORGANIC SALT, PHOTORESIST COMPOSITION INCLUDING THE SAME AND METHOD OF FORMING PATTERN BY USING THE PHOTORESIST PATTERN simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)
- 18746861. ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, METHOD FOR PRODUCING ELECTRONIC DEVICE, AND COMPOUNDS simplified abstract (FUJIFILM Corporation)
- 18829435. RESIST COMPOSITION AND PATTERN FORMING PROCESS (SHIN-ETSU CHEMICAL CO., LTD.)
- 18829508. RESIST COMPOSITION AND PATTERN FORMING PROCESS (SHIN-ETSU CHEMICAL CO., LTD.)
- 18964266. PHOTORESIST COMPOSITION AND METHOD OF FORMING PHOTORESIST PATTERN (Taiwan Semiconductor Manufacturing Co., Ltd.)
B
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- Fujifilm corporation (20240337931). ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, METHOD FOR PRODUCING ELECTRONIC DEVICE, AND COMPOUNDS simplified abstract
- FUJIFILM Corporation Patent Application Trends in 2024
- FUJIFILM Corporation patent applications on October 10th, 2024
I
- Inpria Corporation Patent Application Trends in 2024
- International business machines corporation (20240280899). FABRICATION OF EUV MASKS USING A COMBINATION OF MONOLAYER LITHOGRAPHY AND AREA SELECTIVE DEPOSITION simplified abstract
- International Business Machines Corporation patent applications on August 22nd, 2024
- IUCF-HYU (INDUSTRY-UNIVERSITY COOPERATION FOUNDATION HANYANG UNIVERSITY) Patent Application Trends in 2024
S
- Samsung Display Co., LTD Patent Application Trends in 2024
- SAMSUNG DISPLAY CO., LTD. Patent Application Trends in 2024
- Samsung Display Co., Ltd. Patent Application Trends in 2024
- SAMSUNG ELECTRONICS CO., LTD Patent Application Trends in 2024
- Samsung electronics co., ltd. (20240201588). ORGANIC SALT, PHOTORESIST COMPOSITION INCLUDING THE SAME, AND PATTERN FORMATION METHOD USING THE SAME simplified abstract
- Samsung electronics co., ltd. (20240241438). PHOTORESIST COMPOSITION AND METHOD OF MANUFACTURING INTEGRATED CIRCUIT DEVICE BY USING THE SAME simplified abstract
- Samsung electronics co., ltd. (20240255847). ORGANIC SALT, PHOTORESIST COMPOSITION INCLUDING THE SAME, AND METHOD OF FORMING PATTERN BY USING THE SAME simplified abstract
- Samsung electronics co., ltd. (20240255848). SEMICONDUCTOR PHOTORESIST COMPOSITION AND METHOD OF FORMING PATTERNS USING THE COMPOSITION simplified abstract
- Samsung electronics co., ltd. (20240310724). PHOTORESIST COMPOSITION AND METHOD OF MANUFACTURING INTEGRATED CIRCUIT DEVICE USING THE SAME simplified abstract
- Samsung electronics co., ltd. (20240337928). ORGANIC SALT, PHOTORESIST COMPOSITION INCLUDING THE SAME AND METHOD OF FORMING PATTERN BY USING THE PHOTORESIST PATTERN simplified abstract
- Samsung Electronics Co., Ltd. Patent Application Trends in 2024
- SAMSUNG ELECTRONICS CO., LTD. Patent Application Trends in 2024
- Samsung electronics Co., Ltd. Patent Application Trends in 2024
- Samsung electronics CO., LTD. Patent Application Trends in 2025
- Samsung Electronics Co., Ltd. patent applications on August 1st, 2024
- Samsung Electronics Co., Ltd. patent applications on July 18th, 2024
- Samsung Electronics Co., Ltd. patent applications on June 20th, 2024
- SAMSUNG ELECTRONICS CO., LTD. patent applications on June 20th, 2024
- Samsung Electronics Co., Ltd. patent applications on October 10th, 2024
- SAMSUNG ELECTRONICS CO., LTD. patent applications on October 10th, 2024
- Samsung Electronics Co., Ltd. patent applications on September 19th, 2024
- SAMSUNG ELECTRONICS CO., LTD. patent applications on September 19th, 2024
- SAMSUNG SDI CO., LTD. Patent Application Trends in 2025
- SAMSUNG SDI CO., LTD. patent applications on February 6th, 2025
- SHARP KABUSHIKI KAISHA Patent Application Trends in 2025
- Shin-etsu chemical co., ltd. (20240337927). ONIUM SALT, CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION, AND RESIST PATTERN FORMING PROCESS simplified abstract
- Shin-Etsu Chemical Co., Ltd. Patent Application Trends in 2024
- SHIN-ETSU CHEMICAL CO., LTD. patent applications on October 10th, 2024
- Sumitomo Chemical Company, Limited Patent Application Trends in 2024
- SUMITOMO CHEMICAL COMPANY, LIMITED Patent Application Trends in 2025
T
- Taiwan semiconductor manufacturing co., ltd. (20250093775). PHOTORESIST COMPOSITION AND METHOD OF FORMING PHOTORESIST PATTERN
- Taiwan Semiconductor Manufacturing Co., Ltd. patent applications on March 20th, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd. Patent Application Trends in 2024
- Taiwan Semiconductor Manufacturing Company, Ltd. Patent Application Trends in 2025
- TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. Patent Application Trends in 2025
- Taiwan Semiconductor Manufacturing Company, Ltd. patent applications on March 6th, 2025
- TOKYO ELECTRON LIMITED Patent Application Trends in 2024
- Tokyo Electron Limited Patent Application Trends in 2024
