RADIATION-SENSITIVE COMPOSITION, METHOD FOR FORMING RESIST PATTERN, AND RADIATION-SENSITIVE ACID GENERATOR

Abstract: a radiation-sensitive composition contains a polymer having an acid-releasable group, and a compound represented by formula (1). in the formula (1), lrepresents a group having a (thio)acetal ring or the like. wrepresents a single bond or a (b+1)-valent organic group having 1 to 40 carbon atoms. r, r, and reach independently represent a hydrogen atom, a hydrocarbon group having 1 to 10 carbon atoms, a fluorine atom, or a fluoroalkyl group. rrepresents a fluorine atom or a fluoroalkyl group. a represents an integer of 0 to 8. b represents an integer of 1 to 4. d represents 1 or 2. when a represents 2 or more, a plurality of rare the same or different, and a plurality of rare the same or different. m represents a monovalent cation.

Inventor(s): Ryuichi NEMOTO, Masayuki MIYAKE, Michihiro MITA, Kensuke MIYAO, Satoshi OKAZAKI

CPC Classification: G03F7/0045 ({with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors})

Search for rejections for patent application number 20250164877