18910429. RESIST COMPOSITION AND PATTERN FORMING PROCESS (Shin-Etsu Chemical Co., Ltd.)
RESIST COMPOSITION AND PATTERN FORMING PROCESS
Organization Name
Inventor(s)
Jun Hatakeyama of Joetsu-shi JP
Masahiro Fukushima of Joetsu-shi JP
RESIST COMPOSITION AND PATTERN FORMING PROCESS
This abstract first appeared for US patent application 18910429 titled 'RESIST COMPOSITION AND PATTERN FORMING PROCESS
Original Abstract Submitted
A resist composition comprising an acid generator containing a sulfonium or iodonium salt of an arylsulfonic acid substituted with at least two iodine atoms is provided. It exhibits a high sensitivity and forms a pattern with reduced LWR or improved CDU independent of whether it is of positive or negative type.