RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN

Abstract: a resist composition including a resin component having a constitutional unit derived from a compound represented by general formula (a0-1), and a compound represented by general formula (b0). in the formulas, wrepresents a polymerizable group; lrepresents a divalent linking group or a single bond; raand raeach independently represent a hydrogen atom or a hydrocarbon group having 1 to 12 carbon atoms; rarepresents a fluorine atom, a fluorinated alkyl group having 1 to 6 carbon atoms, or an alkyl group having 1 to 12 carbon atoms; rarepresents a hydrogen atom or an alkyl group having 1 to 6 carbon atoms; m02 represents an integer of 1 to 4; xrepresents a bromine atom or an iodine atom; and nb1 represents an integer of 1 to 5.

Inventor(s): Tetsuya MATSUSHITA

CPC Classification: G03F7/0045 ({with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors})

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