RESIST COMPOSITION, RESIST PATTERN FORMING METHOD, COMPOUND, AND ACID GENERATOR

Abstract: a resist composition including a base material component and a compound represented by general formula (b0), in which rpg represents an acid decomposable group, rlrepresents a cyclic organic group which may have a substituent, lrepresents a divalent linking group, lrepresents a divalent linking group or a single bond, rrepresents a substituent other than an iodine atom, vbrepresents a single bond, rrepresents a hydrogen atom, nb1 represents an integer of 1 to 4, nb2 represents an integer of 1 to 4, nb3 represents an integer of 0 to 3, m represents an m-valent organic cation, and m represents an integer of 1 or greater

Inventor(s): KhanhTin NGUYEN

CPC Classification: G03F7/0045 ({with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors})

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