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Category:G03F1/36
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Pages in category "G03F1/36"
The following 34 pages are in this category, out of 34 total.
1
- 17671021. OPTICAL PROXIMITY CORRECTION METHOD USING CHIEF RAY ANGLE AND PHOTOLITHOGRAPHY METHOD INCLUDING THE SAME simplified abstract (Samsung Electronics Co., Ltd.)
- 17812005. METHOD OF FABRICATING SEMICONDUCTOR DEVICE simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)
- 17841734. MASK LAYOUT CORRECTION METHODS BASED ON MACHINE LEARNING, AND MASK MANUFACTURING METHODS INCLUDING THE CORRECTION METHODS simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)
- 17860139. METHOD OF GENERATING CURVE SUB-RESOLUTION ASSIST FEATURE (SRAF), METHOD OF VERIFYING MASK RULE CHECK (MRC), AND METHOD OF MANUFACTURING MASK INCLUDING METHOD OF GENERATING THE SAME simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)
- 17973514. ENHANCED MASK PATTERN-AWARE HEURISTICS FOR OPTICAL PROXIMITY CORRECTIONS FOR INTEGRATED CIRCUITS simplified abstract (Intel Corporation)
- 18103289. METHOD OF MANUFACTURING PHOTO MASKS AND SEMICONDUCTOR DEVICES simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.)
- 18131436. OPTICAL PROXIMITY CORRECTION METHOD USING NEURAL JACOBIAN MATRIX AND METHOD OF MANUFACTURING MASK BY USING THE OPTICAL PROXIMITY CORRECTION METHOD simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)
- 18318042. PHOTOMASK INCLUDING LINE PATTERN MONITORING MARK AND METHOD OF MANUFACTURING INTEGRATED CIRCUIT DEVICE USING THE SAME simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)
- 18326659. PROCESS PROXIMITY EFFECT CORRECTION METHOD AND PROCESS PROXIMITY EFFECT CORRECTION DEVICE simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)
- 18362842. PIN ACCESS HYBRID CELL HEIGHT DESIGN AND SYSTEM simplified abstract (Taiwan Semiconductor Manufacturing Co., Ltd.)
- 18522888. METHOD OF MAKING INTEGRATED CIRCUIT WITH ASYMMETRIC MIRRORED LAYOUT ANALOG CELLS simplified abstract (Taiwan Semiconductor Manufacturing Co., Ltd.)
- 18526324. DEVICES WITH TRACK-BASED FILL (TBF) METAL PATTERNING simplified abstract (Taiwan Semiconductor Manufacturing Co., Ltd.)
2
- 20240085777.PROCESS PROXIMITY EFFECT CORRECTION METHOD AND PROCESS PROXIMITY EFFECT CORRECTION DEVICE simplified abstract (samsung electronics co., ltd.)
- 20240085778.PHOTOMASK INCLUDING LINE PATTERN MONITORING MARK AND METHOD OF MANUFACTURING INTEGRATED CIRCUIT DEVICE USING THE SAME simplified abstract (samsung electronics co., ltd.)
I
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- Samsung electronics co., ltd. (20240104287). LAYOUT DESIGN METHOD AND METHOD OF MANUFACTURING INTEGRATED CIRCUIT DEVICE USING THE SAME simplified abstract
- SAMSUNG ELECTRONICS CO., LTD. patent applications on February 8th, 2024
- SAMSUNG ELECTRONICS CO., LTD. patent applications on March 14th, 2024
- SAMSUNG ELECTRONICS CO., LTD. patent applications on March 28th, 2024
T
- Taiwan semiconductor manufacturing co., ltd. (20240095438). METHOD OF MAKING INTEGRATED CIRCUIT WITH ASYMMETRIC MIRRORED LAYOUT ANALOG CELLS simplified abstract
- Taiwan semiconductor manufacturing co., ltd. (20240095439). DEVICES WITH TRACK-BASED FILL (TBF) METAL PATTERNING simplified abstract
- Taiwan Semiconductor Manufacturing Co., Ltd. patent applications on March 21st, 2024
- TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. patent applications on January 18th, 2024
U
- US Patent Application 18231070. OPTIMIZED MASK STITCHING simplified abstract
- US Patent Application 18354377. INTEGRATED CIRCUIT AND METHOD OF FORMING THE SAME simplified abstract
- US Patent Application 18359954. Mask Defect Prevention simplified abstract
- US Patent Application 18361815. SEMICONDUCTOR DEVICE simplified abstract
- US Patent Application 18361879. OPTICAL PROXIMITY CORRECTION AND PHOTOMASKS simplified abstract
- US Patent Application 18362195. TRANSMISSION GATE STRUCTURE simplified abstract
- US Patent Application 18362889. IC DEVICE LAYOUT METHOD simplified abstract