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Category:C23C16/02
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This category has the following 27 subcategories, out of 27 total.
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Pages in category "C23C16/02"
The following 71 pages are in this category, out of 71 total.
1
- 17542563. SAM FORMULATIONS AND CLEANING TO PROMOTE QUICK DEPOSITIONS simplified abstract (INTERNATIONAL BUSINESS MACHINES CORPORATION)
- 17954960. SUBSTRATE PROCESSING APPARATUS AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE USING THE SAME simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)
- 17962310. HALOGEN-RESISTANT THERMAL BARRIER COATING FOR PROCESSING CHAMBERS simplified abstract (Applied Materials, Inc.)
- 17991931. AREA SELECTIVE DEPOSITION THROUGH SURFACE SILYLATION simplified abstract (Applied Materials, Inc.)
- 18071391. MATERIALS ENGINEERING FOR ANTI-COKING COATING STACKS simplified abstract (Applied Materials, Inc.)
- 18124495. MULTIWALLED CARBON NANOTUBES BASED FLEXIBLE AND BINDER--FREE ANODE FOR LI-ION BATTERIES simplified abstract (KING FAISAL UNIVERSITY)
- 18223804. MULTIWALLED CARBON NANOTUBES BASED FLEXIBLE AND BINDER-FREE ANODE FOR LI-ION BATTERIES simplified abstract (KING FAISAL UNIVERSITY)
- 18244694. RARE EARTH-PHOSPHATE-ENHANCED THERMAL BARRIER COATING (RTX CORPORATION)
- 18398146. ETCHING METHOD AND PLASMA PROCESSING APPARATUS simplified abstract (Tokyo Electron Limited)
- 18425048. DEPOSITION SYSTEM AND PROCESSING SYSTEM simplified abstract (Samsung Electronics Co., Ltd.)
- 18504007. WAFER CHUCK, METHOD FOR PRODUCING THE SAME, AND EXPOSURE APPARATUS simplified abstract (CANON KABUSHIKI KAISHA)
- 18524767. FILM DEPOSITION APPARATUS FOR FINE PATTERN FORMING simplified abstract (TOKYO ELECTRON LIMITED)
- 18538267. INNER SPACER LINER FOR GATE-ALL-AROUND DEVICE simplified abstract (Applied Materials, Inc.)
- 18543996. TREATMENTS TO ENHANCE MATERIAL STRUCTURES simplified abstract (Applied Materials, Inc.)
- 18547481. NON-METAL INCORPORATION IN MOLYBDENUM ON DIELECTRIC SURFACES simplified abstract (Lam Research Corporation)
- 18555055. SURFACE TREATMENT METHOD AND SUBSTRATE TREATMENT DEVICE simplified abstract (Tokyo Electron Limited)
- 18557675. PROCESSING SYSTEM AND METHODS FOR FORMING VOID-FREE AND SEAM-FREE TUNGSTEN FEATURES simplified abstract (Applied Materials, Inc.)
- 18558366. COATED TOOL AND CUTTING TOOL simplified abstract (KYOCERA CORPORATION)
- 18558388. METHODS TO IMPROVE PRODUCTIVITY OF ADVANCED CVD W GAPFILL PROCESS simplified abstract (Applied Materials, Inc.)
- 18585303. IN SITU NUCLEATION FOR NANOCRYSTALLINE DIAMOND FILM DEPOSITION simplified abstract (Applied Materials, Inc.)
- 18595374. SEGMENTED FORMATION OF GATE INTERFACE simplified abstract (Applied Materials, Inc.)
- 18597415. SUBSTRATE PROCESSING METHOD, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, SUBSTRATE PROCESSING APPARATUS AND NON-TRANSITORY COMPUTER-READABLE RECORDING MEDIUM simplified abstract (Kokusai Electric Corporation)
- 18608005. SELECTIVE COBALT DEPOSITION ON COPPER SURFACES simplified abstract (Applied Materials, Inc.)
- 18615430. DISPLAY ARTICLES WITH ANTIGLARE SURFACES AND THIN, DURABLE ANTIREFLECTION COATINGS simplified abstract (Corning Incorporated)
- 18639575. METHOD FOR MANUFACTURING A SEMICONDUCTOR DEVICE simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.)
- 18645060. GAS BARRIER LAMINATE, PACKAGING BODY AND PACKAGED ARTICLE simplified abstract (TOPPAN Holdings Inc.)
- 18650014. PECVD OF SIBN THIN FILMS WITH LOW LEAKAGE CURRENT simplified abstract (Applied Materials, Inc.)
- 18726285. DETERMINATION METHOD AND SUBSTRATE PROCESSING APPARATUS (Tokyo Electron Limited)
- 18746717. APPARATUS AND METHOD FOR MANUFACTURING METAL GATE STRUCTURES simplified abstract (TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.)
- 18813502. PROCESS FOR MANUFACTURING A SILICON CARBIDE COATED BODY (Applied Materials, Inc.)
- 18814907. FORMING MESAS ON AN ELECTROSTATIC CHUCK (Applied Materials, Inc.)
- 18957283. TIN OXIDE MANDRELS IN PATTERNING (Lam Research Corporation)
- 18970001. METHODS FOR DEPOSITING A MOLYBDENUM NITRIDE FILM ON A SURFACE OF A SUBSTRATE BY A CYCLICAL DEPOSITION PROCESS AND RELATED SEMICONDUCTOR DEVICE STRUCTURES INCLUDING A MOLYBDENUM NITRIDE FILM (ASM IP Holding B.V.)
2
- 20240035158. DEPOSITING COATINGS ON AND WITHIN HOUSINGS, APPARATUS, OR TOOLS UTILIZING PRESSURIZED CELLS simplified abstract (Halliburton Energy Services, Inc.)
- 20240040808. TECHNIQUES AND DEVICE STRUCTURE BASED UPON DIRECTIONAL SEEDING AND SELECTIVE DEPOSITION simplified abstract (Applied Materials, Inc.)
A
- Applied materials, inc. (20240258109). METHOD OF DEPOSITING A TUNGSTEN CONTAINING LAYER simplified abstract
- Applied materials, inc. (20240304437). PECVD OF SIBN THIN FILMS WITH LOW LEAKAGE CURRENT simplified abstract
- Applied materials, inc. (20240339318). SEGMENTED FORMATION OF GATE INTERFACE simplified abstract
- Applied materials, inc. (20240417266). PROCESS FOR MANUFACTURING A SILICON CARBIDE COATED BODY
- Applied materials, inc. (20240420986). FORMING MESAS ON AN ELECTROSTATIC CHUCK
- Applied materials, inc. (20250006474). INTERCONNECT CAPPING WITH INTEGRATED PROCESS STEPS
- Applied Materials, Inc. patent applications on August 1st, 2024
- Applied Materials, Inc. patent applications on December 19th, 2024
- Applied Materials, Inc. patent applications on February 13th, 2025
- Applied Materials, Inc. patent applications on February 6th, 2025
- Applied Materials, Inc. patent applications on January 2nd, 2025
- Applied Materials, Inc. patent applications on October 10th, 2024
- Applied Materials, Inc. patent applications on September 12th, 2024
C
- CANON KABUSHIKI KAISHA patent applications on February 29th, 2024
- Contemporary amperex technology co., limited (20240258584). PROTECTION METHOD AND DEVICE FOR SECONDARY BATTERY, SECONDARY BATTERY, BATTERY MODULE, BATTERY PACK, AND ELECTRIC APPARATUS simplified abstract
- CONTEMPORARY AMPEREX TECHNOLOGY CO., LIMITED patent applications on August 1st, 2024
I
S
- Samsung electronics co., ltd. (20240209495). DEPOSITION SYSTEM AND PROCESSING SYSTEM simplified abstract
- Samsung Electronics Co., Ltd. patent applications on June 27th, 2024
- Seiko epson corporation (20250003063). Particle Coating Apparatus And Method Of Coating Particle
- Seiko epson corporation (20250003064). Particle Coating Apparatus And Method Of Coating Particle
- SEIKO EPSON CORPORATION patent applications on January 2nd, 2025
T
- Taiwan semiconductor manufacturing company, ltd. (20240282571). METHOD FOR MANUFACTURING A SEMICONDUCTOR DEVICE simplified abstract
- Taiwan semiconductor manufacturing company, ltd. (20240337012). APPARATUS AND METHOD FOR MANUFACTURING METAL GATE STRUCTURES simplified abstract
- Taiwan semiconductor manufacturing company, ltd. (20240379398). SEMICONDUCTOR PROCESSING TOOL AND METHOD OF OPERATION simplified abstract
- Taiwan Semiconductor Manufacturing Company, Ltd. patent applications on August 22nd, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd. patent applications on November 14th, 2024
- TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. patent applications on October 10th, 2024
- Tokyo electron limited (20240295020). METHOD AND APPARATUS FOR EMBEDDING TUNGSTEN INTO RECESS FORMED ON SUBSTRATE simplified abstract
- Tokyo Electron Limited patent applications on September 5th, 2024
