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Category:C23C16/52
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Pages in category "C23C16/52"
The following 26 pages are in this category, out of 26 total.
1
- 17864541. PLASMA CONTROL APPARATUS AND PLASMA PROCESSING SYSTEM simplified abstract (Samsung Electronics Co., Ltd.)
- 17961214. LOAD LOCK CHAMBERS AND RELATED METHODS AND STRUCTURES FOR BATCH COOLING OR HEATING simplified abstract (Applied Materials, Inc.)
- 18133909. CANISTER, PRECURSOR TRANSFER SYSTEM HAVING THE SAME AND METHOD FOR MEASURING PRECURSOR REMAINING AMOUNT THEREOF simplified abstract (Samsung Electronics Co., Ltd.)
- 18197919. FLOW CONTROL METHOD USING PLASMA SYSTEM simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)
- 18215454. SUBSTRATE PROCESSING APPARATUS AND EXHAUST METHOD THEREOF simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)
- 18226854. SUBSTRATE PROCESSING METHOD, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, NON-TRANSITORY COMPUTER-READABLE RECORDING MEDIUM AND SUBSTRATE PROCESSING APPARATUS simplified abstract (Kokusai Electric Corporation)
- 18227467. SEMICONDUCTOR MANUFACTURING APPARATUS, GAS SUPPLYING METHOD USING THE SAME, AND SEMICONDUCTOR MANUFACTURING METHOD USING THE SAME simplified abstract (Samsung Electronics Co., Ltd.)
- 18244532. LIQUID RAW MATERIAL SUPPLYING METHOD AND GAS SUPPLY APPARATUS simplified abstract (TOKYO ELECTRON LIMITED)
- 18255407. SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD simplified abstract (TOKYO ELECTRON LIMITED)
- 18263920. SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS simplified abstract (Tokyo Electron Limited)
- 18354220. SUBSTRATE PROCESSING APPARATUS, METHOD OF PROCESSING SUBSTRATE, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, AND RECORDING MEDIUM simplified abstract (Kokusai Electric Corporation)
- 18357293. METHOD OF PROCESSING SUBSTRATE, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, SUBSTRATE PROCESSING APPARATUS, AND RECORDING MEDIUM simplified abstract (Kokusai Electric Corporation)
- 18423636. Dynamic Phased Array Plasma Source For Complete Plasma Coverage Of A Moving Substrate simplified abstract (Applied Materials, Inc.)
- 18451862. FILM FORMING METHOD AND ATMOSPHERIC PLASMA FILM FORMING APPARATUS simplified abstract (FUJIFILM Corporation)
2
- 20240011156. DEPOSITION APPARATUS simplified abstract (Samsung Display Co., Ltd.)
- 20240018660. PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD simplified abstract (Tokyo Electron Limited)
- 20240035158. DEPOSITING COATINGS ON AND WITHIN HOUSINGS, APPARATUS, OR TOOLS UTILIZING PRESSURIZED CELLS simplified abstract (Halliburton Energy Services, Inc.)
B
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- Samsung electronics co., ltd. (20240124972). CANISTER, PRECURSOR TRANSFER SYSTEM HAVING THE SAME AND METHOD FOR MEASURING PRECURSOR REMAINING AMOUNT THEREOF simplified abstract
- Samsung electronics co., ltd. (20240124979). SEMICONDUCTOR MANUFACTURING APPARATUS, GAS SUPPLYING METHOD USING THE SAME, AND SEMICONDUCTOR MANUFACTURING METHOD USING THE SAME simplified abstract
- Samsung Electronics Co., Ltd. patent applications on April 18th, 2024
- SAMSUNG ELECTRONICS CO., LTD. patent applications on January 25th, 2024