18244532. LIQUID RAW MATERIAL SUPPLYING METHOD AND GAS SUPPLY APPARATUS simplified abstract (TOKYO ELECTRON LIMITED)

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LIQUID RAW MATERIAL SUPPLYING METHOD AND GAS SUPPLY APPARATUS

Organization Name

TOKYO ELECTRON LIMITED

Inventor(s)

Hiroaki Dewa of Hokkaido (JP)

Satoshi Mizunaga of Iwate (JP)

Naohide Ito of Iwate (JP)

LIQUID RAW MATERIAL SUPPLYING METHOD AND GAS SUPPLY APPARATUS - A simplified explanation of the abstract

This abstract first appeared for US patent application 18244532 titled 'LIQUID RAW MATERIAL SUPPLYING METHOD AND GAS SUPPLY APPARATUS

Simplified Explanation

The patent application describes a method of supplying a liquid raw material to a gas supply device, which includes a storage tank, a heating unit, a level detecting unit, gas inlet and outlet, and a raw material inlet.

  • The method involves determining the liquid surface level in the storage tank and supplying a specified amount of liquid raw material when the level is equal to or lower than a target level.
  • This process is repeated a specified number of times to maintain the liquid surface level in the storage tank.

Potential Applications

This technology could be applied in industries that require precise control over the supply of liquid raw materials to gas supply devices, such as in manufacturing processes or chemical production.

Problems Solved

1. Ensures a consistent supply of liquid raw material to the gas supply device. 2. Prevents interruptions in the gas generation process due to low levels of liquid raw material in the storage tank.

Benefits

1. Improved efficiency in gas generation processes. 2. Reduced downtime and maintenance costs. 3. Enhanced control and monitoring of liquid raw material levels.

Potential Commercial Applications

Optimizing Liquid Raw Material Supply for Gas Generation Processes

Possible Prior Art

There may be existing systems or methods for monitoring and controlling liquid raw material levels in storage tanks for gas supply devices, but further research would be needed to identify specific prior art in this field.

Unanswered Questions

== How does this method compare to existing technologies for liquid raw material supply in gas supply devices? This article does not provide a direct comparison to existing technologies, leaving the reader to wonder about the advantages and disadvantages of this method in relation to other solutions.

== What are the specific industries or sectors that could benefit most from implementing this technology? The article does not delve into the potential target markets or industries where this innovation could have the most significant impact, leaving room for speculation on its applicability in various sectors.


Original Abstract Submitted

Provided is a method of supplying a liquid raw material to a gas supply device. The gas supply device includes: a storage tank that stores the liquid raw material; a heating unit that heats the liquid raw material to generate a raw material gas; a level detecting unit that detects a liquid surface level of the liquid raw material stored in the storage tank; a gas inlet and a gas outlet provided in the storage tank; and a raw material inlet provided in the storage tank. The method includes: determining whether the liquid surface level of the liquid raw material is equal to or lower than a supply target level; and repeating supply of a specified amount of liquid raw material to the storage tank a specified number of times when the liquid surface level of the liquid raw material is equal to or lower than the supply target level.