18133909. CANISTER, PRECURSOR TRANSFER SYSTEM HAVING THE SAME AND METHOD FOR MEASURING PRECURSOR REMAINING AMOUNT THEREOF simplified abstract (Samsung Electronics Co., Ltd.)
Contents
- 1 CANISTER, PRECURSOR TRANSFER SYSTEM HAVING THE SAME AND METHOD FOR MEASURING PRECURSOR REMAINING AMOUNT THEREOF
- 1.1 Organization Name
- 1.2 Inventor(s)
- 1.3 CANISTER, PRECURSOR TRANSFER SYSTEM HAVING THE SAME AND METHOD FOR MEASURING PRECURSOR REMAINING AMOUNT THEREOF - A simplified explanation of the abstract
- 1.4 Simplified Explanation
- 1.5 Potential Applications
- 1.6 Problems Solved
- 1.7 Benefits
- 1.8 Potential Commercial Applications
- 1.9 Possible Prior Art
- 1.10 Unanswered Questions
- 1.11 Original Abstract Submitted
CANISTER, PRECURSOR TRANSFER SYSTEM HAVING THE SAME AND METHOD FOR MEASURING PRECURSOR REMAINING AMOUNT THEREOF
Organization Name
Inventor(s)
CANISTER, PRECURSOR TRANSFER SYSTEM HAVING THE SAME AND METHOD FOR MEASURING PRECURSOR REMAINING AMOUNT THEREOF - A simplified explanation of the abstract
This abstract first appeared for US patent application 18133909 titled 'CANISTER, PRECURSOR TRANSFER SYSTEM HAVING THE SAME AND METHOD FOR MEASURING PRECURSOR REMAINING AMOUNT THEREOF
Simplified Explanation
The abstract of the patent application describes a canister that supplies a precursor to a processing chamber. The canister includes a body, valves for introducing a carrier gas and discharging a sublimated gas of a solid precursor, a tray for accommodating the solid precursor, and at least one piezoelectric transducer for vibrating the tray or measuring a resonance frequency.
- Body with valves for carrier gas and sublimated gas
- Tray for solid precursor accommodation
- Piezoelectric transducer for vibrating tray or measuring resonance frequency
Potential Applications
The technology could be used in semiconductor manufacturing, chemical vapor deposition processes, and thin film deposition applications.
Problems Solved
This technology solves the problem of efficiently supplying solid precursors to processing chambers without clogging or inconsistent flow.
Benefits
The benefits of this technology include improved process control, increased efficiency, and reduced downtime due to clogging or inconsistent precursor flow.
Potential Commercial Applications
- "Innovative Canister Technology for Precursor Supply in Semiconductor Manufacturing"
Possible Prior Art
One possible prior art could be traditional canisters with manual control valves for precursor supply in processing chambers.
Unanswered Questions
How does the piezoelectric transducer affect the performance of the canister?
The piezoelectric transducer helps in vibrating the precursor tray or measuring the resonance frequency, but the specific impact on the overall performance of the canister is not detailed in the abstract.
What is the specific design of the precursor accommodating tray?
While the abstract mentions a precursor accommodating tray, it does not provide details on the specific design or material used for the tray.
Original Abstract Submitted
A canister supplying a precursor to a processing chamber includes a body, a first valve introducing a carrier gas into the body, a second valve discharging a sublimated gas of a solid precursor into a processing chamber, a precursor accommodating tray accommodating the solid precursor, and at least one piezoelectric transducer at least one of vibrating the precursor accommodating tray or measuring a resonance frequency.
