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Category:B08B3/02
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Pages in category "B08B3/02"
The following 38 pages are in this category, out of 38 total.
1
- 17847208. WET CLEANING TOOL AND METHOD simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.)
- 17870340. WAFER POLISHING APPARATUS AND METHOD OF DETECTING DEFECT OF RETAINER RING INCLUDED IN THE WAFER POLISHING APPARATUS simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)
- 17884555. ONSITE CLEANING SYSTEM AND METHOD simplified abstract (TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.)
- 18057397. APPARATUS FOR REMOVING A PHOTORESIST AND APPARATUS OF MANUFACTURING A SEMICONDUCTOR DEVICE simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)
- 18117592. SUBSTRATE PROCESSING APPARATUS INCLUDING NOZZLE UNIT AND SUBSTRATE PROCESSING METHOD simplified abstract (SEMES CO., LTD.)
- 18158276. CLEANING LIQUID NOZZLE, CLEANING APPARATUS, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE USING THE SAME simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)
- 18217815. APPARATUS FOR MANUFACTURING SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE USING THE SAME simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)
- 18239503. LIQUID CHEMICAL TANK MODULE AND LIQUID CHEMICAL SUPPLY APPARATUS INCLUDING THE SAME simplified abstract (SEMES CO., LTD.)
- 18307526. SUBSTRATE CLEANING DEVICE AND SUBSTRATE CLEANING METHOD simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)
- 18336217. SUBSTRATE CLEANING CHAMBER, A SUBSTRATE PROCESSING SYSTEM INCLUDING THE SAME, AND A METHOD OF PROCESSING A SUBSTRATE USING THE SUBSTRATE PROCESSING SYSTEM simplified abstract (Samsung Electronics Co., Ltd.)
- 18467683. SUBSTRATE CLEANING APPARATUS AND SUBSTRATE CLEANING METHOD simplified abstract (SCREEN Holdings Co., Ltd.)
- 18494434. CLOTHES TREATMENT APPARATUS AND CONTROL METHOD THEREFOR simplified abstract (LG ELECTRONICS INC.)
- 18517194. SEMICONDUCTOR WAFER CLEANING APPARATUS simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.)
- 18522792. CONTROL APPARATUS FOR ELECTRIC AIRCRAFT simplified abstract (DENSO CORPORATION)
2
- 20240024926. PRESSURE WASHER WITH CONTAINER HOLDER simplified abstract (Generac Power Systems, Inc.)
- 20240033754. MULTIFUNCTIONAL CLEANING MACHINE simplified abstract (PANIOR INC)
- 20240042968. VEHICLE CLEANING DEVICE, MANUFACTURING METHOD THEREOF, AND ASSEMBLY METHOD THEREOF simplified abstract (KOITO MANUFACTURING CO., LTD.)
- 20240050990. APPARATUS FOR TREATING SUBSTRATE AND METHOD FOR TREATING A SUBSTRATE simplified abstract (SEMES CO., LTD.)
- 20240050999. RINSE NIPPLE simplified abstract (Goodrich Corporation)
- 20240082881.SUBSTRATE CLEANING DEVICE AND SUBSTRATE CLEANING METHOD simplified abstract (samsung electronics co., ltd.)
B
- Blockchain patent applications on 22nd Mar 2024
- Blockchain patent applications on April 25th, 2024
- Blockchain patent applications on February 15th, 2024
- Blockchain patent applications on February 1st, 2024
- Blockchain patent applications on February 8th, 2024
- Blockchain patent applications on January 25th, 2024
- Blockchain patent applications on March 21st, 2024
- Blockchain patent applications on May 30th, 2024
S
- Samsung electronics co., ltd. (20240173751). SUBSTRATE CLEANING CHAMBER, A SUBSTRATE PROCESSING SYSTEM INCLUDING THE SAME, AND A METHOD OF PROCESSING A SUBSTRATE USING THE SUBSTRATE PROCESSING SYSTEM simplified abstract
- SAMSUNG ELECTRONICS CO., LTD. patent applications on March 14th, 2024
- Samsung Electronics Co., Ltd. patent applications on May 30th, 2024
T
U
- US Patent Application 18127028. WASTE LIQUID SCATTERING PREVENTION DEVICE AND WASTE LIQUID SCATTERING PREVENTION METHOD simplified abstract
- US Patent Application 18143135. ONE PIECE HIGH TEMPERATURE WASHER simplified abstract
- US Patent Application 18231196. APPARATUS FOR ELECTRO-CHEMICAL PLATING simplified abstract
- US Patent Application 18322855. SUBSTRATE CLEANING APPARATUS AND SUBSTRATE CLEANING METHOD simplified abstract