17884555. ONSITE CLEANING SYSTEM AND METHOD simplified abstract (TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.)
Contents
ONSITE CLEANING SYSTEM AND METHOD
Organization Name
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
Inventor(s)
Sung-Han Tsai of Taichung City (TW)
Chueh-Chi Kuo of Kaohsiung City (TW)
Li-Jui Chen of Hsinchu City (TW)
ONSITE CLEANING SYSTEM AND METHOD - A simplified explanation of the abstract
This abstract first appeared for US patent application 17884555 titled 'ONSITE CLEANING SYSTEM AND METHOD
Simplified Explanation
The patent application describes a cleaning device for removing particles from a tool using a combination of cleaning liquid, pressurized gas, and vacuum suction.
- Nozzle structure with spray opening to spray cleaning liquid onto the tool.
- Cleaning pad around the nozzle structure to clean the tool.
- Support around the cleaning pad with gas openings to blow pressurized gas onto the tool.
- Support also has vacuum openings to suck residual gas, liquid, and particles around the tool.
- Combination of gas openings and vacuum openings creates an air wall around the tool to prevent contamination in the chamber.
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- Potential Applications
- Semiconductor manufacturing
- Precision engineering
- Medical device manufacturing
- Problems Solved
- Contamination of tools during cleaning process
- Efficient removal of particles from delicate surfaces
- Minimizing downtime for tool maintenance
- Benefits
- Improved cleaning efficiency
- Reduced risk of contamination
- Enhanced tool longevity and performance
Original Abstract Submitted
A cleaning device for cleaning particles from a tool includes a nozzle structure having a spray opening to spray a cleaning liquid in a first direction to the tool, a cleaning pad disposed around the nozzle structure, and a support disposed around the cleaning pad. The cleaning pad exposes the spray opening and includes a front surface facing in the first direction to clean the tool. The support includes multiple gas openings to blow a pressurized gas in the first direction to the tool, and multiple vacuum openings to suck residual gas, liquid and particles around the tool. An air wall around the tool is thus generated by a combination of operations performed by the multiple gas openings and the multiple vacuum openings to reduce or prevent contamination that might be caused by the cleaning device in the chamber.
