17847208. WET CLEANING TOOL AND METHOD simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.)

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WET CLEANING TOOL AND METHOD

Organization Name

Taiwan Semiconductor Manufacturing Company, Ltd.

Inventor(s)

Hsu. Tung. Yen of Kaohsiung (TW)

Ling-Sung Wang of Tainan (TW)

Chen-Chieh Chiang of Kaohsiung (TW)

P.H. Huang of Tainan (TW)

C.L. Lin of Kaohsiung (CN)

WET CLEANING TOOL AND METHOD - A simplified explanation of the abstract

This abstract first appeared for US patent application 17847208 titled 'WET CLEANING TOOL AND METHOD

Simplified Explanation

The patent application describes a semiconductor cleaning tool that includes a nozzle connected to receive a carrier gas and one or more fluids. The nozzle has separate gas and fluid passageways, with interweaving branches for controlling the flow rate, temperature, on/off state, type of fluid or gas, time period, and supply mode of each branch.

  • The cleaning tool is designed for semiconductor cleaning purposes.
  • The tool includes a nozzle with separate gas and fluid passageways.
  • The gas passageway has branches for controlling the flow rate, temperature, on/off state, type of gas, time period, and supply mode.
  • The fluid passageway also has branches for controlling the flow rate, temperature, on/off state, type of fluid, time period, and supply mode.
  • The gas and fluid passage branches are arranged in an interweaving pattern within the nozzle.
  • Each gas and fluid passage branch can be controlled independently and separately.
  • The tool allows for precise control of spraying fluids and carrier gas onto the semiconductor surface.

Potential Applications

This technology has potential applications in the semiconductor industry for cleaning and maintaining semiconductor surfaces.

Problems Solved

The cleaning tool solves the problem of effectively and precisely cleaning semiconductor surfaces by providing separate control over the carrier gas and fluids being sprayed.

Benefits

The tool offers the following benefits:

  • Precise control over the flow rate, temperature, on/off state, type of fluid or gas, time period, and supply mode.
  • Efficient and effective cleaning of semiconductor surfaces.
  • Improved maintenance and longevity of semiconductor devices.


Original Abstract Submitted

A semiconductor cleaning tool is provided. The cleaning tool comprises a nozzle. The nozzle is connected with a first inlet to receive a carrier gas and a second inlet to receive one or more fluids. The nozzle comprises a gas passageway connected to the first inlet; and fluid passageway connected to the second inlet. The gas passageway comprises gas passage branches and the fluid passageway comprises fluid passage branches. The gas passage branches and the fluid passage branches are arranged interweavingly in the nozzle. Individual gas/fluid passage branches are controllable indecently and separately including a flow rate, a temperature, an on/off state, a type of fluid(s) or carrier gas, a time period, a supply mode, and/or any other aspects of spraying the fluid(s) and carrier gas through the individual gas passage branches and the individual fluid passage branches.

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