18307526. SUBSTRATE CLEANING DEVICE AND SUBSTRATE CLEANING METHOD simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)
SUBSTRATE CLEANING DEVICE AND SUBSTRATE CLEANING METHOD
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SUBSTRATE CLEANING DEVICE AND SUBSTRATE CLEANING METHOD - A simplified explanation of the abstract
This abstract first appeared for US patent application 18307526 titled 'SUBSTRATE CLEANING DEVICE AND SUBSTRATE CLEANING METHOD
Simplified Explanation
The patent application describes a substrate cleaning device with two roll members made of a copolymer of two water-soluble polymers, each having protrusions on their surfaces.
- The substrate cleaning device includes a first roll member and a second roll member.
- The first roll member has a first roll body with first protrusions on its surface.
- The second roll member has a second roll body with second protrusions on its surface.
- Both roll members are made of a copolymer of a first water-soluble polymer and a second water-soluble polymer.
Potential Applications
- Cleaning of substrates in manufacturing processes.
- Surface preparation in industries like electronics, printing, or textiles.
Problems Solved
- Efficient removal of contaminants from substrates.
- Improved adhesion of coatings or films on substrates.
Benefits
- Enhanced cleaning performance.
- Increased productivity in manufacturing processes.
- Cost-effective solution for substrate cleaning.
Original Abstract Submitted
A substrate cleaning device may include a first roll member and a second roll member including a copolymer of a first water-soluble polymer and a second water-soluble polymer. The first roll member may include a first roll body extending in a first direction and first protrusions on a surface of the first roll body. The second roll member may include a second roll body extending in the first direction and second protrusions on a surface of the second roll body.
