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Category:G03F9/00
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Pages in category "G03F9/00"
The following 24 pages are in this category, out of 24 total.
1
- 17383849. METHOD FOR CALIBRATING ALIGNMENT OF WAFER AND LITHOGRAPHY SYSTEM simplified abstract (TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.)
- 17847111. TECHNOLOGIES FOR OVERLAY METROLOGY MARKS simplified abstract (Intel Corporation)
- 17933968. ALIGNMENT-OVERLAY MARK AND METHOD USING THE SAME simplified abstract (Micron Technology, Inc.)
- 18062080. MEASUREMENT APPARATUS, LITHOGRAPHY APPARATUS, AND ARTICLE MANUFACTURING METHOD simplified abstract (CANON KABUSHIKI KAISHA)
- 18153242. INFORMATION PROCESSING APPARATUS AND INFORMATION PROCESSING METHOD simplified abstract (CANON KABUSHIKI KAISHA)
- 18354078. IMPRINTING METHOD, IMPRINT APPARATUS AND ARTICLE MANUFACTURING METHOD simplified abstract (CANON KABUSHIKI KAISHA)
- 18449779. DETECTION DEVICE, DETECTION METHOD, LITHOGRAPHY APPARATUS, AND ARTICLE MANUFACTURING METHOD simplified abstract (CANON KABUSHIKI KAISHA)
- 18457983. PATTERN FORMATION METHOD, SEMICONDUCTOR DEVICE MANUFACTURING METHOD, AND IMPRINT APPARATUS simplified abstract (Kioxia Corporation)
- 18492587. INFORMATION PROCESSING APPARATUS AND INFORMATION PROCESSING METHOD simplified abstract (CANON KABUSHIKI KAISHA)
2
- 20240027919. MASSIVE OVERLAY METROLOGY SAMPLING WITH MULTIPLE MEASUREMENT COLUMNS simplified abstract (KLA Corporation)
- 20240036480. A SUBSTRATE COMPRISING A TARGET ARRANGEMENT, AND ASSOCIATED AT LEAST ONE PATTERNING DEVICE, LITHOGRAPHIC METHOD AND METROLOGY METHOD simplified abstract (ASML NETHERLANDS B.V.)