Pages that link to "Category:Kartik Ramaswamy of San Jose CA (US)"
The following pages link to Category:Kartik Ramaswamy of San Jose CA (US):
Displaying 20 items.
- 17835864. PULSED VOLTAGE SOURCE FOR PLASMA PROCESSING APPLICATIONS simplified abstract (Applied Materials, Inc.) (← links)
- 20240011153. CONTINUOUS LINER FOR USE IN A PROCESSING CHAMBER simplified abstract (Applied Materials, Inc.) (← links)
- 17947675. WIDEBAND VARIABLE IMPEDANCE LOAD FOR HIGH VOLUME MANUFACTURING QUALIFICATION AND ON-SITE DIAGNOSTICS simplified abstract (Applied Materials, Inc.) (← links)
- 17960666. IN-SITU ELECTRIC FIELD DETECTION METHOD AND APPARATUS simplified abstract (Applied Materials, Inc.) (← links)
- 17988083. METHODS AND APPARATUS FOR PROCESSING A SUBSTRATE simplified abstract (Applied Materials, Inc.) (← links)
- 18059658. SYSTEM AND METHODS FOR IMPLEMENTING A MICRO PULSING SCHEME USING DUAL INDEPENDENT PULSERS simplified abstract (Applied Materials, Inc.) (← links)
- 18059222. SOLID-STATE SWITCH BASED HIGH-SPEED PULSER WITH PLASMA IEDF MODIFICATION CAPABILITY THROUGH MULTILEVEL OUTPUT FUNCTIONALITY simplified abstract (Applied Materials, Inc.) (← links)
- 18076725. LEARNING BASED TUNING IN A RADIO FREQUENCY PLASMA PROCESSING CHAMBER simplified abstract (Applied Materials, Inc.) (← links)
- 18612757. PULSED VOLTAGE SOURCE FOR PLASMA PROCESSING APPLICATIONS simplified abstract (Applied Materials, Inc.) (← links)
- Applied materials, inc. (20240249915). PLASMA EXCITATION WITH ION ENERGY CONTROL simplified abstract (← links)
- 18628009. PLASMA EXCITATION WITH ION ENERGY CONTROL simplified abstract (Applied Materials, Inc.) (← links)
- Applied materials, inc. (20240258070). PLASMA UNIFORMITY CONTROL SYSTEM AND METHODS simplified abstract (← links)
- Applied materials, inc. (20240266152). PLASMA UNIFORMITY CONTROL SYSTEM AND METHODS simplified abstract (← links)
- Applied materials, inc. (20240412947). RADIO-FREQUENCY (RF) MATCHING NETWORK FOR FAST IMPEDANCE TUNING (← links)
- Applied materials, inc. (20240420921). IMMERSED PLASMA SOURCE AND PROCESS CHAMBER FOR LARGE AREA SUBSTRATES (← links)
- 18209348. IMMERSED PLASMA SOURCE AND PROCESS CHAMBER FOR LARGE AREA SUBSTRATES (Applied Materials, Inc.) (← links)
- Applied materials, inc. (20250069921). IN-SITU SEMICONDUCTOR PROCESSING CHAMBER TEMPERATURE APPARATUS (← links)
- Applied materials, inc. (20250087462). RADIO-FREQUENCY (RF) MATCHING NETWORK AND TUNING TECHNIQUE (← links)
- 18244202. RADIO-FREQUENCY (RF) MATCHING NETWORK AND TUNING TECHNIQUE (Applied Materials, Inc.) (← links)
- 18943632. IN-SITU SEMICONDUCTOR PROCESSING CHAMBER TEMPERATURE APPARATUS (Applied Materials, Inc.) (← links)