Applied materials, inc. (20250069921). IN-SITU SEMICONDUCTOR PROCESSING CHAMBER TEMPERATURE APPARATUS

IN-SITU SEMICONDUCTOR PROCESSING CHAMBER TEMPERATURE APPARATUS

Organization Name

applied materials, inc.

Inventor(s)

Andrew Nguyen of San Jose CA (US)

Yogananda Sarode of Bangalore (IN)

Xue Chang of San Jose CA (US)

Kartik Ramaswamy of San Jose CA (US)

IN-SITU SEMICONDUCTOR PROCESSING CHAMBER TEMPERATURE APPARATUS

This abstract first appeared for US patent application 20250069921 titled 'IN-SITU SEMICONDUCTOR PROCESSING CHAMBER TEMPERATURE APPARATUS

Original Abstract Submitted

methods and systems for in-situ temperature control are provided. the system includes a temperature-sensing dis. the temperature-sensing disc has a body, a front surface and a back surface opposing the front surface. one or more cameras are positioned on the front surface, the back surface, or both the front surface and the back surface. the one or more cameras are configured for performing infrared-based imaging of a surface of a processing chamber.